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Volumn 504, Issue , 2002, Pages 191-198
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Atomic structures of Si(1 1 1) surface during silane UHV-CVD
a
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Author keywords
Adatoms; Chemical vapor deposition; Growth; Hydrogen atom; Nucleation; Scanning tunneling microscopy; Silicon; Surface structure, morphology, roughness, and topography
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Indexed keywords
ANNEALING;
CHEMICAL VAPOR DEPOSITION;
CRYSTAL GROWTH;
HIGH TEMPERATURE EFFECTS;
SCANNING TUNNELING MICROSCOPY;
SEMICONDUCTING SILICON;
SILANES;
SURFACE STRUCTURE;
ULTRAHIGH VACUUM;
GROWTH TEMPERATURE;
CRYSTAL ATOMIC STRUCTURE;
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EID: 0037140027
PISSN: 00396028
EISSN: None
Source Type: Journal
DOI: 10.1016/S0039-6028(02)01068-3 Document Type: Article |
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Times cited : (6)
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References (16)
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