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note
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The fact that a (2 × 1) RHEED pattern was observed during Si(100) growth in the low-temperature regime can be explained by the formation of monohydrides on the surface. In this phase, one hydrogen atom bonded to each surface Si atom, resulting in the saturation of each dangling bond and the preservation of Si dimers along the surface.
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Note that we have seen no evident change in RHEED patterns when the growth temperatures decreased from 600 to 550°C. A possible explanation for this is that the RHEED coherence length is about some hundreds of A, if only some isolated islands were formed on the terraces, they might not be sensible to RHEED diffraction [V. Le Thanh et al., J. Cryst. Growth 135 (1994) 1].
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