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Volumn 369, Issue 1-3, 1996, Pages 85-90

A metastable (√3 × √3)R30° reconstruction of the Si(111) surface, induced by silicon adatoms

Author keywords

Homoepitaxy; Hydrogen desorption; Nucleation; Phase transition; Silane; Silicon adatom; Step flow; Surface reconstruction

Indexed keywords

DESORPTION; EPITAXIAL GROWTH; FLUXES; HYDROGEN; NUCLEATION; PHASE TRANSITIONS; REFLECTION HIGH ENERGY ELECTRON DIFFRACTION; SILANES; SURFACE STRUCTURE; THERMAL EFFECTS;

EID: 0030380779     PISSN: 00396028     EISSN: None     Source Type: Journal    
DOI: 10.1016/s0039-6028(96)00879-5     Document Type: Article
Times cited : (6)

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    • note
    • The fact that a (2 × 1) RHEED pattern was observed during Si(100) growth in the low-temperature regime can be explained by the formation of monohydrides on the surface. In this phase, one hydrogen atom bonded to each surface Si atom, resulting in the saturation of each dangling bond and the preservation of Si dimers along the surface.
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