Improvement of SiO2 properties by heating treatment in high pressure H2O vapor

Japanese Journal of Applied Physics, Part 2: Letters

Volumn 36, Issue 6 A, 1997, Pages

  Sameshima, Toshiyuki ^a   Satoh, Mitsuru ^a  

^a TOKYO UNIVERSITY OF AGRICULTURE AND TECHNOLOGY   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

CARRIER CONCENTRATION; CHEMICAL VAPOR DEPOSITION; HEAT TREATMENT; HYDROLYSIS; INTERFACES (MATERIALS); MOLECULAR VIBRATIONS; PRESSURE EFFECTS; SEMICONDUCTING SILICON; STEAM; SURFACE PROPERTIES; THERMAL EFFECTS;

PLASMA CHEMICAL VAPOR DEPOSITION;

SILICA;

EID: 0031162871     PISSN: 00214922     EISSN: None     Source Type: Journal    
DOI: 10.1143/jjap.36.l687     Document Type: Article

References (9)