Oxygen plasma reactive ion etching of tetrahedral amorphous carbon

Japanese Journal of Applied Physics, Part 2: Letters

Volumn 35, Issue 12 A, 1996, Pages

  Park, J S ^a   Milne, W I ^a  

^a Hanyang University   (South Korea)

Author keywords

[No Author keywords available]

Indexed keywords

AMORPHOUS FILMS; AMORPHOUS MATERIALS; ELECTRIC ARCS; IONS; OXYGEN; PLASMA ETCHING; PRESSURE EFFECTS;

REACTIVE ION ETCHING;

CARBON;

EID: 0030389376     PISSN: 00214922     EISSN: None     Source Type: Journal    
DOI: 10.1143/jjap.35.l1550     Document Type: Article

References (17)