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Volumn 305, Issue 3-4, 2002, Pages 351-359
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A percolation based dielectric breakdown model with randomic changes in the dielectric constant
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Author keywords
Dielectric breakdown; Dynamic percolation model; Semiconductor devices; SiO2 oxide
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Indexed keywords
ELECTRIC BREAKDOWN;
ELECTRIC FIELD EFFECTS;
PERMITTIVITY;
WEIBULL DISTRIBUTION;
DIELECTRIC BREAKDOWN;
MOS CAPACITORS;
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EID: 0037086222
PISSN: 03784371
EISSN: None
Source Type: Journal
DOI: 10.1016/S0378-4371(01)00615-X Document Type: Article |
Times cited : (5)
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References (18)
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