Rapid, reversible, sensitive porous silicon gas sensor

Journal of Applied Physics

Volumn 91, Issue 4, 2002, Pages 2519-2523

  Seals, Lenward ^a   Gole, James L ^a   Tse, Laam Angela ^b   Hesketh, Peter J ^b  

^a GEORGIA INSTITUTE OF TECHNOLOGY   (United States)

^b GEORGIA INSTITUTE OF TECHNOLOGY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ELECTRICAL CONTACTS; ELECTROLESS GOLD PLATING; ELECTROLESS METALLIZATION; LOW-RESISTANCE CONTACTS; MESOPOROUS; POROUS SILICON GAS SENSORS; SPREADING RESISTANCE;

GAS DETECTORS; GOLD PLATING; POROUS SILICON;

CHEMICAL SENSORS;

EID: 0037084085     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.1436556     Document Type: Article

References (39)

1. L. T. Canham, Appl. Phys. Lett. 57, 1046 (1990). apl APPLAB 0003-6951
2. M. J. Sailor and E. J. Lee, Adv. Mater. 9, 783 (1997); amt ADVMEW 0935-9648
3. L. Zeltner, M. Thoenissen, Th. Hierl, R. Brendl, and M. Schulz, Prog. Photovoltaics 6, 423 (1998); pro PPHOED 1062-7995
4. L. Stalmans, J. Poortmans, H. Bender, M. Caymax, K. Said, E. Vazsonyi, J. Nijs, and R. Mertens, 6, 233 (1998). pro PPHOED 1062-7995
5. R. Halimaoui, in Porous Silicon Science and Technology, edited by J. C. Vial and J. Derrien (Les Editions de Physique, Les Ulis, France, 1995), p. 33.
6. J. Gao, T. Gao, and M. J. Sailor, Appl. Phys. Lett. 77, 901 (2000). apl APPLAB 0003-6951
7. S. Zangooie, R. Bjorklund, and H. Arwin, Sens. Actuators B 43, 168 (1997). sbc SABCEB 0925-4005
8. J. Harper and M. J. Sailor, Anal. Chem. 68, 3713 (1996). anc ANCHAM 0003-2700
9. I. Schechter, M. Ben-Chorin, and A. Kux, Anal. Chem. 67, 3727 (1995). anc ANCHAM 0003-2700
10. R. C. Anderson, R. S. Muller, and C. W. Tobias, Sens. Actuators A 21-23, 835 (1990). sac SAAPEB 0924-4247
11. A. Motohashi, M. Ruike, M. Kawakami, H. Aoyagi, A. Kinoshita, and A. Satou, Jpn. J. Appl. Phys., Part 1 35, 4253 (1996). jjb JAPNDE 0021-4922
12. G. M. O'Halloran et al., Proceedings of Eurosensors XIII, 12-15 September 1999, The Hague, The Netherlands, p. 55.
13. L. Boarino, C. Baratto, F. Geobaldo, G. Amato, E. Comini, A. M. Rossi, F. Faglia, G. Lerondel, and G. Sbervoglieri, Mater. Sci. Eng., B 69-70, 210 (2000). msb MSBTEK 0921-5107
14. J. L. Gole, L. Seals, and P. Lillehei, J. Electrochem. Soc. 147, 3785 (2000). jes JESOAN 0013-4651
15. J. L. Gole, P. Lillehei, L. Seals, J. A. DeVincentis, and S. Narasimha, Phys. Rev. B 61, 7589 (2000). prb PRBMDO 0163-1829
16. J. L. Gole, J. A. DeVincentis, and L. Seals, J. Phys. Chem. B 103, 979 (1999). bfk JPCBFK 1089-5647
17. J. L. Gole, L. Seals, J. A. DeVincentis, P. Lillehei, S. M. Prokes, and D. A. Dixon, Phys. Rev. B 61, 5615 (2000). prb PRBMDO 0163-1829
18. W. E. Carlos, S. M. Prokes, J. L. Gole, and L. Seals, Phys. Rev. B 62, 1878 (2000). prb PRBMDO 0163-1829
19. F. Dudel, D. R. Grantier, J. L. Gole, and D. A. Dixon, Phys. Rev. B 56, 2137 (1997); prb PRBMDO 0163-1829
20. J. L. Gole and D. A. Dixon, J. Phys. Chem. 101, 8096 (1997); jch JPCHAX 0022-3654
21. J. Phys. Chem. B 102, 33 (1998); bfk JPCBFK 1089-5647
22. F. Dudel and J. L. Gole, J. Appl. Phys. 82, 802 (1997). jap JAPIAU 0021-8979
23. H. M. van Noort, B. C. M. Meenderink, and A. Malenaar, J. Electrochem. Soc. 133, 263 (1986). jes JESOAN 0013-4651
24. CRC Handbook of Chemistry and Physics, 72nd ed., edited by D. R. Lide (Chemical Rubber, Boca Raton, FL, 1991).
25. T. B. Fryberger and S. Semancik, Sens. Actuators B 2, 305 (1990); sbc SABCEB 0925-4005
26. P. T. Moseley, J. Norris, and D. E. Williams, Techniques and Mechanisms in Gas Sensing (Hilger, New York, 1991).
27. E. J. Lee, J. S. Ha, and M. J. Sailor, J. Am. Chem. Soc. 117, 8295 (1995). acs JACSAT 0002-7863
28. J. Gao, T. Gao, and M. J. Sailor, Appl. Phys. Lett. 77, 901 (2000). apl APPLAB 0003-6951
29. S. Chan, P. M. Fauchet, Y. Li, L. J. Rathberg, and B. L. Miller, Phys. Status Solidi A 182, 541 (2000). psa PSSABA 0031-8965
30. V. Lehmann, F. Hofmann, F. Moller, and U. Gruning, Thin Solid Films 225, 20 (1995). tsf THSFAP 0040-6090
31. A. J. Simons, T. I. Cox, M. J. Uren, and P. D. J. Calcott, Thin Solid Films 225, 12 (1995). tsf THSFAP 0040-6090
32. K. Watanabe, T. Okada, I. Choe, and Y. Sato, Sens. Actuators B 33, 194 (1996). sbc SABCEB 0925-4005
33. A. Foucaran, F. Pascal-Delannoy, A. Giani, A. Sackda, P. Comette, and A. Boyer, Thin Solid Films 297, 317 (1997). tsf THSFAP 0040-6090
34. M. Ono, K. Shimanoe, N. Miura, and N. Yamazoe, Solid State Ionics 136-137, 583 (2000). ssi SSIOD3 0167-2738
35. A. Spetz, M. Armgarth, and I. Lundstrom, J. Appl. Phys. 64, 1274 (1988). jap JAPIAU 0021-8979
36. Z. Jin, Y. Su, and Y. Duan, Sens. Actuators B 72, 75 (2000). sbc SABCEB 0925-4005
37. K. Nakagawa, K. Kumon, C. Tsutusmi, K. Tabuchi, T. Kitagawa, and Y. Sadaoka, Sens. Actuators B 65, 138 (2000). sbc SABCEB 0925-4005
38. M. S. Freund and N. S. Lewis, Proc. Natl. Acad. Sci. U.S.A. 92, 2652 (1995). pna PNASA6 0027-8424
39. L. A. Tse, L. Seals, J. Gole, D. Rosen, and P. J. Hesketh, Proceedings of the 200th Meeting of The Electrochemical Society, San Francisco, 2-7 September 2001.