Fluorine etching on the Si(1 1 1)-7 × 7 surfaces using fluorinated fullerene

Surface Science

Volumn 521, Issue 1-2, 2002, Pages 43-48

  Fujikawa, Y ^a   Sadowski, J T ^a   Kelly, K F ^a   Nakayama, K S ^a   Nagao, T ^a   Sakurai, T ^a  

^a TOHOKU UNIVERSITY   (Japan)

Author keywords

Etching; Fullerenes; Halogens; Scanning tunneling microscopy; Silicon

Indexed keywords

ADSORPTION; ANNEALING; DIFFUSION; ETCHING; FLUORINE; SCANNING TUNNELING MICROSCOPY; SILICON;

NANOSCALE ETCH PITS;

FULLERENES;

EID: 0037058802     PISSN: 00396028     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0039-6028(02)02278-1     Document Type: Article

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