Fluorinated fullerene thin films grown on the Si(111)-7 × 7 surfaces - STM and HREELS investigations

Journal of Crystal Growth

Volumn 229, Issue 1, 2001, Pages 580-585

  Sadowski, J T ^a,c   Fujikawa, Y ^a   Kelly, K F ^a   Nakayama, K ^a   Sakurai, T ^a   Mickelson, E T ^b   Hauge, R H ^b   Margrave, J L ^b  

^a TOHOKU UNIVERSITY   (Japan)

^b RICE UNIVERSITY   (United States)

^c INSTITUTE OF VACUUM TECHNOLOGY   (Poland)

Author keywords

A1. Adsorption; A1. Etching; A1. Surface processes; B1. Fullerenes; B1. Nanomaterials; B1. Organic compounds

Indexed keywords

ADSORPTION; CHEMICAL BONDS; DIFFUSION IN SOLIDS; ELECTRON ENERGY LOSS SPECTROSCOPY; ETCHING; FILM GROWTH; FLUORINE; NANOSTRUCTURED MATERIALS; SCANNING TUNNELING MICROSCOPY; SEMICONDUCTING SILICON; THIN FILMS;

CARBON FLUORIDE;

FULLERENES;

EID: 0035399357     PISSN: 00220248     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0022-0248(01)01232-5     Document Type: Article

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