Influence of oxidation temperature, film thickness and substrate on NO2 sensing of SnO2 ultra thin films

Sensors and Actuators, B: Chemical

Volumn 87, Issue 2, 2002, Pages 321-330

  Karthigeyan, A ^a   Gupta, R P ^a   Burgmair, M ^b   Sharma, S K ^c   Eisele, I ^b  

^a CENTRAL ELECTRONICS ENGINEERING RESEARCH INSTITUTE   (India)

^b BUNDESWEHR UNIVERSITY MUNICH   (Germany)

^c MALAVIYA NATIONAL INSTITUTE OF TECHNOLOGY   (India)

Author keywords

Kelvin probe; NO2 sensitivity; Tin oxide; Work function

Indexed keywords

ATMOSPHERIC HUMIDITY; AUGER ELECTRON SPECTROSCOPY; FABRICATION; NITROGEN OXIDES; OXIDATION; SILICA; TIN COMPOUNDS; ULTRATHIN FILMS;

CONTACT POTENTIAL DIFFERENCE (CPD);

CHEMICAL SENSORS;

EID: 0037058581     PISSN: 09254005     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0925-4005(02)00266-6     Document Type: Article

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