Air sensitive tin dioxide thin films by magnetron sputtering and thermal oxidation technique

Sensors and Actuators, B: Chemical

Volumn 48, Issue 1-3, 1998, Pages 403-408

  Shishkin, Nickolay Yakovlevich ^a   Zharsky, Ivan Mikhailovich ^a   Lugin, Valeriy Gennadievich ^a   Zarapin, Vitally Georgievich ^a  

^a BELARUSIAN STATE TECHNOLOGICAL UNIVERSITY   (Belarus)

Author keywords

Oxygen sensitivity; Thin films; Tin dioxide

Indexed keywords

ELECTRIC CONDUCTIVITY; MAGNETRON SPUTTERING; OXIDATION; OXYGEN; PHYSICAL PROPERTIES; PLATINUM; SCANNING ELECTRON MICROSCOPY; SEMICONDUCTING TIN COMPOUNDS; SEMICONDUCTOR DOPING; TRANSMISSION ELECTRON MICROSCOPY;

CHEMICAL PROPERTY; OXYGEN SENSITIVITY; SENSOR PROPERTY; THERMAL OXIDATION TECHNIQUE; TIN DIOXIDE;

THIN FILMS;

EID: 0032068427     PISSN: 09254005     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0925-4005(98)00104-X     Document Type: Article

References (4)

1. 2, Sens. Actuators B 7 (1992) 709-716.
2. J.F. McAleer, P.T. Mosoley, J.O.W. Norris, D.E. Williams, Tin dioxide gas sensors. Part 1. Aspects of the surface chemistry revealed by electrical conductance variations, J. Chem. Soc., Faraday Trans. 1 83 (1987) 1323-1346.
3. 2 surface, Surf. Sci. 192 (1987) 243-264.
4. x, Thin Solid Films 163 (1988) 189-202.