Soft-lithography-mediated chemical vapor deposition of architectured carbon nanotube networks on elastomeric polymer

Langmuir

Volumn 18, Issue 1, 2002, Pages 1-5

  Ng, Hou Tee ^a   Foo, Maw Lin ^a,b   Fang, Aiping ^a   Li, Jun ^c,d   Xu, Guoqin ^a   Jaenicke, Stephan ^a   Chan, Lap ^e   Li, Sam Fong Yau ^a  

^a NATIONAL UNIVERSITY OF SINGAPORE   (Singapore)

^b PRINCETON UNIVERSITY   (United States)

^c INSTITUTE OF MATERIALS RESEARCH AND ENGINEERING   (Singapore)

^d NASA AMES RESEARCH CENTER   (United States)

^e RD Chartered Semiconductor Mfg   (Singapore)

Author keywords

[No Author keywords available]

Indexed keywords

CARBON NANOTUBES; CATALYSTS; CHEMICAL SENSORS; CHEMICAL VAPOR DEPOSITION; ELECTROCHEMISTRY; LITHOGRAPHY; POLYMERS; WETTING;

SURFACE WETTING;

ELASTOMERS;

EID: 0037039613     PISSN: 07437463     EISSN: None     Source Type: Journal    
DOI: 10.1021/la0108095     Document Type: Article

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