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Journal of Physics D: Applied Physics
Volumn 35, Issue 11, 2002, Pages 1141-1148
Balancing incident heat and ion flow for process optimization in plasma based ion implantation
(3)
Mandl S
a
Manova, D
b
Rauschenbach, B
a,c
a
LEIBNIZ INSTITUTE OF SURFACE ENGINEERING IOM
(
Germany
)
b
UNIVERSITY OF AUGSBURG
(
Germany
)
c
Inst Experimentelle Physik II
(
Germany
)
Author keywords
[No Author keywords available]
Indexed keywords
CURRENT DENSITY; ELECTRIC POTENTIAL; HEAT TRANSFER; OPTIMIZATION; PLASMA APPLICATIONS; PROBLEM SOLVING; SPUTTERING; THERMAL DIFFUSION; THERMAL EFFECTS;
ION FLOWS;
ION IMPLANTATION;
EID
:
0037036005
PISSN
:
00223727
EISSN
:
None
Source Type
:
Journal
DOI
:
10.1088/0022-3727/35/11/308
Document Type
:
Article
Times cited : (
21
)
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