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Surface and Coatings Technology

Volumn 103-104, Issue , 1998, Pages 257-261

Structural investigations of titanium nitride films formed by plasma immersion ion implantation

(4) Volz, K a Ensinger, W a Stritzker, B a Rauschenbach, B a

a UNIVERSITY OF AUGSBURG (Germany)

Author keywords

Microstructure; Plasma immersion ion implantation; Titanium nitride; Transmission electron microscopy

Indexed keywords

ELECTRON CYCLOTRON RESONANCE; ELECTRON DIFFRACTION; MICROSTRUCTURE; MORPHOLOGY; NITROGEN; PHASE TRANSITIONS; PLASMA SOURCES; SILICON WAFERS; THIN FILMS; TITANIUM NITRIDE; TRANSMISSION ELECTRON MICROSCOPY; X RAY DIFFRACTION;

PLASMA IMMERSION ION IMPLANTATION; TITANIUM NITRIDE FILM;

ION IMPLANTATION;

EID: 0032068714 PISSN: 02578972 EISSN: None Source Type: Journal
DOI: 10.1016/S0257-8972(98)00405-8 Document Type: Article

Times cited : (10)

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