The interplay of sputtering and oxidation during plasma diffusion treatment

Applied Physics Letters

Volumn 75, Issue 13, 1999, Pages 1851-1853

  Parascandola, S ^a   Kruse, O ^a   Moller W ^a  

^a INSTITUTE OF ION BEAM PHYSICS AND MATERIALS RESEARCH   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0001039273     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.124849     Document Type: Article

References (11)

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