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Plasma Sources Science and Technology

Volumn 10, Issue 3, 2001, Pages 423-429

Heat balance during plasma immersion ion implantation

(3) Manova, D a Mandl S a,c Rauschenbach, B b

a UNIVERSITY OF AUGSBURG (Germany)

b UNIVERSITY OF LEIPZIG (Germany)

c LEIBNIZ INSTITUTE OF SURFACE ENGINEERING IOM (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

PLASMA IMMERSION ION IMPLANTATION (PIII);

COMPUTER SIMULATION; ELECTRIC POTENTIAL; NITROGEN; PLASMA DENSITY; PLASMA SHEATHS; THERMAL EFFECTS; THRESHOLD VOLTAGE;

ION IMPLANTATION;

EID: 0035418433 PISSN: 09630252 EISSN: None Source Type: Journal
DOI: 10.1088/0963-0252/10/3/305 Document Type: Article

Times cited : (40)

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