Plasma-enhanced chemical vapor deposition of SiOx/SiNx Bragg reflectors

Thin Solid Films

Volumn 416, Issue 1-2, 2002, Pages 224-232

  Gottschalch, V ^a   Schmidt, R ^a   Rheinlander B ^a   Pudis, D ^b   Hardt, S ^a   Kvietkova, J ^b   Wagner, G ^c   Franzheld, R ^a  

^a UNIVERSITY OF LEIPZIG   (Germany)

^b SLOVAK UNIVERSITY OF TECHNOLOGY   (Slovakia)

^c LEIBNIZ INSTITUTE OF SURFACE ENGINEERING IOM   (Germany)

Author keywords

Amorphous materials; Bragg mirror; Silicon nitride; Silicon oxide

Indexed keywords

ELLIPSOMETRY; MIRRORS; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; SILICON NITRIDE; SPECTROSCOPIC ANALYSIS; SUBSTRATES;

BRAGG REFLECTORS;

AMORPHOUS FILMS;

EID: 0037009698     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0040-6090(02)00704-6     Document Type: Article

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