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Volumn 23, Issue 12, 2002, Pages 707-709

Improvement in electrical characteristics of ultrathin thermally grown SiO2 by selective anodic oxidation

Author keywords

Dielectric thin films; Leakage currents; MOS capacitors; Reliability testing

Indexed keywords

DIELECTRIC FILMS; ELECTRIC CURRENT CONTROL; ELECTRIC PROPERTIES; LEAKAGE CURRENTS; MOS CAPACITORS; RELIABILITY; SEMICONDUCTOR GROWTH; SILICA; THERMAL EFFECTS; VOLTAGE CONTROL;

EID: 0037005454     PISSN: 07413106     EISSN: None     Source Type: Journal    
DOI: 10.1109/LED.2002.805742     Document Type: Letter
Times cited : (17)

References (8)
  • 1
    • 0031140867 scopus 로고    scopus 로고
    • Quantum-mechanical modeling of electron tunneling current from the inversion layer of ultra-thin-oxide nMOSFETs
    • May
    • S.-H. Lo, D. A. Buchanan, Y. Taur, and W. Wang, "Quantum-mechanical modeling of electron tunneling current from the inversion layer of ultra-thin-oxide nMOSFETs," IEEE Electron Device Lett., vol. 18, pp. 209-211, May 1997.
    • (1997) IEEE Electron Device Lett. , vol.18 , pp. 209-211
    • Lo, S.-H.1    Buchanan, D.A.2    Taur, Y.3    Wang, W.4
  • 2
    • 0031150209 scopus 로고    scopus 로고
    • Reliability and integration of ultra-thin gate dielectrics for advanced CMOS
    • D. A. Buchanon and S. H. Lo, "Reliability and integration of ultra-thin gate dielectrics for advanced CMOS," Microelectron. Eng., vol. 36, pp. 13-20, 1997.
    • (1997) Microelectron. Eng. , vol.36 , pp. 13-20
    • Buchanon, D.A.1    Lo, S.H.2
  • 3
    • 0029514106 scopus 로고
    • A consistent model for the thickness dependence of the intrinsic breakdown in ultrathin oxides
    • R. Degraeve, G. Groeseneken, R. Bellens, M. Depas, and H. E. Maes, "A consistent model for the thickness dependence of the intrinsic breakdown in ultrathin oxides," in IEDM Tech. Dig., 1995, pp. 863-866.
    • (1995) IEDM Tech. Dig. , pp. 863-866
    • Degraeve, R.1    Groeseneken, G.2    Bellens, R.3    Depas, M.4    Maes, H.E.5
  • 4
    • 0032254844 scopus 로고    scopus 로고
    • Point contact conduction at the oxide breakdown of MOS devices
    • J. Sune, E. Miranda, M. Nafria, and X. Aymerich, "Point contact conduction at the oxide breakdown of MOS devices," in IEDM Tech. Dig., 1998, pp. 191-194.
    • (1998) IEDM Tech. Dig. , pp. 191-194
    • Sune, J.1    Miranda, E.2    Nafria, M.3    Aymerich, X.4
  • 5
    • 0030398247 scopus 로고    scopus 로고
    • Thin-gate oxides prepared by pure water anodization followed by rapid thermal densification
    • M.-J. Jeng and J.-G. Hwu, "Thin-gate oxides prepared by pure water anodization followed by rapid thermal densification," IEEE Electron Device Lett., vol. 17, pp. 575-577, 1996.
    • (1996) IEEE Electron Device Lett. , vol.17 , pp. 575-577
    • Jeng, M.-J.1    Hwu, J.-G.2
  • 7
    • 0031625563 scopus 로고    scopus 로고
    • Dielectric reliability measurement methods: A review
    • A. Martin, P. O'Sullivan, and A. Mathewson, "Dielectric reliability measurement methods: A review," Microelectron. Rel., vol 38, pp. 37-72, 1998.
    • (1998) Microelectron. Rel. , vol.38 , pp. 37-72
    • Martin, A.1    O'Sullivan, P.2    Mathewson, A.3


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.