Silicon field emission arrays with atomically sharp tips: Turn-on voltage and the effect of tip radius distribution

IEEE Transactions on Electron Devices

Volumn 49, Issue 12, 2002, Pages 2333-2342

  Ding, Meng ^a   Sha, Guobin ^a   Akinwande, Akintunde I ^a  

^a Massachusetts Institute of Technology Cambridge   (United States)

Author keywords

Chemical mechanical polishing (CMP); Field emission; Fowler Nordheim (FN) theory; Low temperature oxidation; Transmission electron microscopy (TEM)

Indexed keywords

CHEMICAL MECHANICAL POLISHING; CURRENT VOLTAGE CHARACTERISTICS; ELECTRIC POTENTIAL; OPTIMIZATION; OXIDATION; SEMICONDUCTING SILICON; TRANSMISSION ELECTRON MICROSCOPY;

FOWLER-NORDHEIM THEORY; LOW TEMPERATURE OXIDATION; SILICON FIELD EMISSION ARRAYS; TIP RADIUS DISTRIBUTION;

FIELD EMISSION DISPLAYS;

EID: 0037002306     PISSN: 00189383     EISSN: None     Source Type: Journal    
DOI: 10.1109/TED.2002.805230     Document Type: Article

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