Monolithic fabrication and electrical characteristics of polycrystalline silicon field emitters and thin film transistor

Japanese Journal of Applied Physics, Part 2: Letters

Volumn 35, Issue 1 B, 1996, Pages

  Hashiguchi, Gen ^a   Mimura, Hidenori ^a   Fujita, Hiroyuki ^a  

^a NIPPON STEEL CORPORATION   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

ANISOTROPY; ETCHING; POLYCRYSTALLINE MATERIALS; SEMICONDUCTING SILICON; SEMICONDUCTOR DEVICE MANUFACTURE; THIN FILM TRANSISTORS; TRANSFER MOLDING;

ANISOTROPIC ETCHING; POLYCRYSTALLINE SILICON FIELD EMITTERS;

MONOLITHIC INTEGRATED CIRCUITS;

EID: 0029769462     PISSN: 00214922     EISSN: None     Source Type: Journal    
DOI: 10.1143/jjap.35.l84     Document Type: Article

References (19)