Characterization of negative tone photoresist based on acid catalyzed dehydration crosslinking of novolac resins having pendant carboxyl groups

Journal of Polymer Research

Volumn 9, Issue 4, 2002, Pages 251-256

  Liu, Hui Hsiang ^a   Chen, Wei Tin ^a   Wu, Fuh Tsang ^a  

^a NATIONAL CHENG KUNG UNIVERSITY   (Taiwan)

Author keywords

Borneol; Dehydration; Development; Novolac resin; Photoacid generator; Photoresist; Resolution

Indexed keywords

CATALYSIS; CROSSLINKING; DEHYDRATION; ESTERIFICATION; ETHERS; MOLECULAR STRUCTURE; PHENOLIC RESINS; PHOTORESISTS; SYNTHESIS (CHEMICAL); THERMOGRAVIMETRIC ANALYSIS;

BINDER RESINS;

COPOLYMERIZATION;

EID: 0036994347     PISSN: 10229760     EISSN: None     Source Type: Journal    
DOI: 10.1023/A:1021359903385     Document Type: Article

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