Preparation and characterization of photoreactive copolymers containing curable pendants for positive photoresist

Journal of Applied Polymer Science

Volumn 80, Issue 3, 2001, Pages 328-333

  Liu, Jui Hsiang ^a   Lin, Seng Hei ^a   Shih, Jen Chieh ^a  

^a NATIONAL CHENG KUNG UNIVERSITY   (Taiwan)

Author keywords

[No Author keywords available]

Indexed keywords

CHEMICAL BONDS; COPOLYMERIZATION; CROSSLINKING; FOURIER TRANSFORM INFRARED SPECTROSCOPY; NUCLEAR MAGNETIC RESONANCE; OPTICAL MICROSCOPY; PHOTOREACTIVITY; PHOTORESISTS; PYROLYSIS; SCANNING ELECTRON MICROSCOPY; SYNTHESIS (CHEMICAL);

PHOTOACID GENERATOR;

COPOLYMERS;

EID: 0035313065     PISSN: 00218995     EISSN: None     Source Type: Journal    
DOI: 10.1002/1097-4628(20010418)80:3<328::AID-APP1103>3.0.CO;2-J     Document Type: Article

References (11)

1. Ershov, V. V.; Nikiforov, G. A.; De Jonge, C. Quinonediazide; Elsevier: New York, 1981, p. 261.
2. Kosbar, L. L.; Frank, C. W.; Pease, R. F. W.; Hutchinson, J. ACS Symp Series 1993, 527, 245.
3. Ahne, H.; Rubner, R.; Kuhn, E. Eur. Pat. Disclosure, EP0023626 (1980).
4. Rubner, R.; Hammerschmid, A.; Leuschner, R.; Ahne, H. Polymers for Microelectronics - PME'89; VCH publishers: New York; Kodansha Scientific Ltd.: Tokyo, 1989, p. 789.
5. Grishina, A. D.; Vannikov, A. V.; Khazova, G. O.; Teodoradze, M. G.; Koltsov, Y. I. J Photochem Photobiol A Chem 1998, 114, 159.
6. Dinaburg, M. S. Photosensitive Diazo Compounds; The Focal Library: London, 1964.
7. Nader, A. E.; Imai, K.; Craig, J. D. Polym Eng Sci 1992, 32, 1613.
8. Allen, R.; Foster, M.; Yen, Y. T. J Electrochem Soc 1980, 127, 1379.
9. Hiraoka, H.; Pacansky, J. J Electrochem Soc 1981, 128, 2645.
10. Liu, J. H.; Lee, S. Y.; Tsai, F. R. J Appl Polym Sci 1998, 70, 2401.
11. Liu, J. H.; Tsai, F. R.; Tsai, T. Y. Polym Adv Technol 2000, 11, 228.