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Volumn 41, Issue 12 A, 2002, Pages

Development of two-step deposition process for interface-modified ramp-edge Josephson junction with low sheet inductance and small spread

Author keywords

Interface modified barrier; Pulsed laser deposition; Ramp edge junction; Two step deposition

Indexed keywords

AMORPHOUS FILMS; CRITICAL CURRENT DENSITY (SUPERCONDUCTIVITY); FILM GROWTH; INTERFACES (MATERIALS); LANTHANUM COMPOUNDS; MAGNESIA; MAGNETRON SPUTTERING; PULSED LASER DEPOSITION; SEMICONDUCTOR JUNCTIONS; SPUTTER DEPOSITION; SUBSTRATES; YTTRIUM BARIUM COPPER OXIDES;

EID: 0036975176     PISSN: 00214922     EISSN: None     Source Type: Journal    
DOI: 10.1143/jjap.41.l1366     Document Type: Letter
Times cited : (12)

References (8)


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.