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Volumn 41, Issue 12 A, 2002, Pages
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Development of two-step deposition process for interface-modified ramp-edge Josephson junction with low sheet inductance and small spread
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Author keywords
Interface modified barrier; Pulsed laser deposition; Ramp edge junction; Two step deposition
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Indexed keywords
AMORPHOUS FILMS;
CRITICAL CURRENT DENSITY (SUPERCONDUCTIVITY);
FILM GROWTH;
INTERFACES (MATERIALS);
LANTHANUM COMPOUNDS;
MAGNESIA;
MAGNETRON SPUTTERING;
PULSED LASER DEPOSITION;
SEMICONDUCTOR JUNCTIONS;
SPUTTER DEPOSITION;
SUBSTRATES;
YTTRIUM BARIUM COPPER OXIDES;
INTERFACE-MODIFIED BARRIER;
MAGNETIC PENETRATION DEPTH;
RAMP-EDGE JUNCTION;
SHEET INDUCTANCE;
SINGLE FLUX QUANTUM CIRCUIT;
TWO-STEP DEPOSITION;
JOSEPHSON JUNCTION DEVICES;
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EID: 0036975176
PISSN: 00214922
EISSN: None
Source Type: Journal
DOI: 10.1143/jjap.41.l1366 Document Type: Letter |
Times cited : (12)
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References (8)
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