Self-tuning EWMA controller utilizing artificial neural network function approximation techniques

Proceedings of the IEEE/CPMT International Electronic Manufacturing Technology (IEMT) Symposium

Volumn , Issue , 1996, Pages 355-363

  Smith, Taber ^a   Boning, Duane ^a  

^a Massachusetts Institute of Technology Cambridge   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ARTIFICIAL INTELLIGENCE; CHEMICAL POLISHING; CONTROL EQUIPMENT; NEURAL NETWORKS; PARAMETER ESTIMATION; PROCESS CONTROL; QUALITY CONTROL; STATE ESTIMATION;

CHEMICAL MECHANICAL PROCESSING (CMP); FUNCTION MAPPING; SELF TUNING EXPONENTIALLY WEIGHTED MOVING AVERAGE (EWMA) CONTROLLER;

SEMICONDUCTOR DEVICE MANUFACTURE;

EID: 0030380744     PISSN: None     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper

References (17)