Surface contamination control using integrated cleaning

Semiconductor International

Volumn 21, Issue 6, 1998, Pages 173-176

  Butterbaugh, Jeffery W ^a  

^a FSI International   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

CONTAMINATION; MIXTURES; PROCESS CONTROL; SILICON WAFERS; SURFACE CLEANING; VAPOR DEPOSITION;

INTEGRATED CLEANING; SURFACE CONTAMINATION CONTROL;

SEMICONDUCTOR DEVICE MANUFACTURE;

EID: 0032097016     PISSN: 01633767     EISSN: None     Source Type: Journal    
DOI: None     Document Type: Article

References (12)

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