New results in high energy proximity x-ray lithography

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 4343, Issue 1, 2001, Pages 176-181

  Khan, M ^a   Han, G ^a   Maldonado, J ^a,b   Cerrina, F ^a  

^a UNIVERSITY OF WISCONSIN MADISON   (United States)

^b Etec Systems Inc   (United States)

Author keywords

Proximity X ray Lithography; PXL

Indexed keywords

ELECTRON ABSORPTION; ENERGY GAP; FEATURE EXTRACTION; HIGH ENERGY ELECTRON DIFFRACTION; MASKS; OPTICAL RESOLVING POWER; PHOTONS; PROXIMITY SENSORS;

GAP SETTING;

X RAY LITHOGRAPHY;

EID: 0034757235     PISSN: 0277786X     EISSN: None     Source Type: Journal    
DOI: 10.1117/12.436639     Document Type: Article

References (7)