Synthesis of some onium salts and their comparison as cationic photoinitiators in an epoxy resist

Polymer

Volumn 38, Issue 7, 1997, Pages 1719-1723

  Everett, J P ^a   Schmidt, D L ^b   Rose, G D ^b   Argritis, P ^c   Aidinis, C J ^c   Hatzakis, M ^c  

^a Dow Deutschland GmbH   (Germany)

^b DOW CHEMICAL COMPANY   (United States)

^c INSTITUTE OF MICROELECTRONICS   (Greece)

Author keywords

Cationic photoinitiators; Epoxy; Sulfonium salts

Indexed keywords

AROMATIC COMPOUNDS; ELECTRON BEAMS; INITIATORS (CHEMICAL); IRRADIATION; LITHOGRAPHY; PHOTORESISTS; SULFUR COMPOUNDS; SYNTHESIS (CHEMICAL);

CATIONIC PHOTOINITIATORS; EPOXY RESIST; ONIUM SALTS; PHOTOSENSITIZER;

SALTS;

EID: 0031098196     PISSN: 00323861     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0032-3861(96)00673-8     Document Type: Article

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