Thick-layer resists for surface micromachining

Journal of Micromechanics and Microengineering

Volumn 10, Issue 2, 2000, Pages 108-115

  Loechel, Bernd ^a  

^a HAHN MEITNER INSTITUT   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

ALLOYS; ELECTRODEPOSITION; GALVANIZING; LITHOGRAPHY; METALS; MICROELECTRONIC PROCESSING; MICROMACHINING; PHOTORESISTS; SEMICONDUCTING SILICON; SURFACE PROPERTIES; SURFACE TREATMENT; ULTRAVIOLET RADIATION;

BUMP FABRICATION; GALVANOPLATING; MICROELECTROMECHANICAL SYSTEMS; THICK PHOTORESISTS; THREE DIMENSIONAL MICRO COMPONENTS; WIRE INTERCONNECT TECHNOLOGY;

MICROELECTRONICS;

EID: 0033690970     PISSN: 09601317     EISSN: None     Source Type: Journal    
DOI: 10.1088/0960-1317/10/2/302     Document Type: Article

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