-
1
-
-
85076000072
-
Negative DUV Photoresist for 16Mb-DRAM Production and Future Generations
-
Conley, W.; Brunsvold, W.; Ferguson, R.; Gelorme, J.; Holmes, S.; Martino, R.; Petryniak, M.; Rabidoux, P.; Sooriyakumaran, R.; Sturtevant, J. Negative DUV Photoresist for 16Mb-DRAM Production and Future Generations. Proc. SPIE Int. Soc. Opt. Eng. 1993, 1925, 120.
-
(1993)
Proc. SPIE Int. Soc. Opt. Eng.
, vol.1925
, pp. 120
-
-
Conley, W.1
Brunsvold, W.2
Ferguson, R.3
Gelorme, J.4
Holmes, S.5
Martino, R.6
Petryniak, M.7
Rabidoux, P.8
Sooriyakumaran, R.9
Sturtevant, J.10
-
4
-
-
0026882532
-
Dissolution Inhibition-type Photoresists for Deep-UV Lithography
-
Funhoff, D.; Binder, H.; Nguyen-Khim, S.; Schwalm, R. Dissolution Inhibition-type Photoresists for Deep-UV Lithography. Prog. Org. Coat. 1992, 20, 289.
-
(1992)
Prog. Org. Coat.
, vol.20
, pp. 289
-
-
Funhoff, D.1
Binder, H.2
Nguyen-Khim, S.3
Schwalm, R.4
-
5
-
-
0019933084
-
Evaluation of Pure Novolak Cresol-Formaldehyde Resins for Deep UV Lithography
-
Gipstein, E.; Ouano, A. C.; Tompkins, T. Evaluation of Pure Novolak Cresol-Formaldehyde Resins for Deep UV Lithography. J. Electrochem. Soc. Solid State Sci. Technol. 1982, 129 (1), 201.
-
(1982)
J. Electrochem. Soc. Solid State Sci. Technol.
, vol.129
, Issue.1
, pp. 201
-
-
Gipstein, E.1
Ouano, A.C.2
Tompkins, T.3
-
7
-
-
84986959239
-
Photochemistry of Azide-Phenolic Resin Photoresists
-
Hashimoto, M.; Iwayanagi, T.; Shiraishi, H.; Nonogaki, S. Photochemistry of Azide-Phenolic Resin Photoresists. Polym. Eng. Sci. 1986, 26, 1090.
-
(1986)
Polym. Eng. Sci.
, vol.26
, pp. 1090
-
-
Hashimoto, M.1
Iwayanagi, T.2
Shiraishi, H.3
Nonogaki, S.4
-
8
-
-
0026258473
-
Dissolution Inhibition of Phenolic Resins by Diazonaphthoquinone: Effect of Polymer Structure
-
Hattori, T.; Ueno, T.; Shiraishi, H.; Hayashi, N.; Iwayanagi, T. Dissolution Inhibition of Phenolic Resins by Diazonaphthoquinone: Effect of Polymer Structure. Jpn. J. Appl. Phys. 1991, 30 (11B), 3125.
-
(1991)
Jpn. J. Appl. Phys.
, vol.30
, Issue.11 B
, pp. 3125
-
-
Hattori, T.1
Ueno, T.2
Shiraishi, H.3
Hayashi, N.4
Iwayanagi, T.5
-
9
-
-
0000538737
-
Enviromentally Stable Chemical Amplification Positive Resist: Principle, Chemistry, Contamination Resistance and Lithographic Feasibility
-
Ito, H.; Breyta, G.; Hofer, D.; Sooriyakumaran, R.; Petrilo, K.; Seeger, D. Enviromentally Stable Chemical Amplification Positive Resist: Principle, Chemistry, Contamination Resistance and Lithographic Feasibility. J. Photopolym. Sci. Technol. 1994, 7 (3), 433.
-
(1994)
J. Photopolym. Sci. Technol.
, vol.7
, Issue.3
, pp. 433
-
-
Ito, H.1
Breyta, G.2
Hofer, D.3
Sooriyakumaran, R.4
Petrilo, K.5
Seeger, D.6
-
10
-
-
0011718733
-
Studies on Polystyrene Monomer and Excimer Quenching by Poly(p-hydroxystyrene) in Solution
-
Jiang, Y. C.; Lucki, J.; Rabek, J. F.; Ranby, B. Studies on Polystyrene Monomer and Excimer Quenching by Poly(p-hydroxystyrene) in Solution. Makromol. Chem., Rapid Commun. 1986, 7, 563.
-
(1986)
Makromol. Chem., Rapid Commun.
, vol.7
, pp. 563
-
-
Jiang, Y.C.1
Lucki, J.2
Rabek, J.F.3
Ranby, B.4
-
11
-
-
0028479742
-
Photo-Cross-Linking of Poly(4-hydroxystyrene) via Electrophilic Aromatic Substitution: Use of Polyfunctional Benzylic Alcohols in the Design of Chemically Amplified Resist Materials with Tunable Sensitivities
-
Lee, S. M.; Frechet, J. M. J.; Willson, C. G. Photo-Cross-Linking of Poly(4-hydroxystyrene) via Electrophilic Aromatic Substitution: Use of Polyfunctional Benzylic Alcohols in the Design of Chemically Amplified Resist Materials with Tunable Sensitivities. Macromolecules 1994, 27, 5154.
-
(1994)
Macromolecules
, vol.27
, pp. 5154
-
-
Lee, S.M.1
Frechet, J.M.J.2
Willson, C.G.3
-
12
-
-
0025897725
-
Dissolution of Poly(p-hydroxystyrene): Molecular Weight Effects
-
Long, T.; Rodriguez, F. Dissolution of Poly(p-hydroxystyrene): Molecular Weight Effects. Proc. SPIE Int. Soc. Opt. Eng. 1991, 1466, 188.
-
(1991)
Proc. SPIE Int. Soc. Opt. Eng.
, vol.1466
, pp. 188
-
-
Long, T.1
Rodriguez, F.2
-
14
-
-
4344603802
-
On the Role of Intermolecular Hydrogen Bonding in Miscible Polymer Blends
-
Moskala, E. J.; Howe, S. E.; Painter, P. C.; Coleman, M. M. On the Role of Intermolecular Hydrogen Bonding in Miscible Polymer Blends. Macromolecules 1984, 17, 1671.
-
(1984)
Macromolecules
, vol.17
, pp. 1671
-
-
Moskala, E.J.1
Howe, S.E.2
Painter, P.C.3
Coleman, M.M.4
-
15
-
-
0019556529
-
Differential Scanning Calorimetric Studies on the Glass Transition Temperature of Polyhydroxystyrene Derivatives Containing Sorbed Water
-
Nakamura, K.; Hatakeyama, T.; Hatakeyama, H. Differential Scanning Calorimetric Studies on the Glass Transition Temperature of Polyhydroxystyrene Derivatives Containing Sorbed Water. Polymer 1981, 22, 473.
-
(1981)
Polymer
, vol.22
, pp. 473
-
-
Nakamura, K.1
Hatakeyama, T.2
Hatakeyama, H.3
-
16
-
-
2842578605
-
-
Jpn. Kokai Tokkyo Koho 01,103,604, 1989
-
Ozawa, N.; Matsumoto, T.; Takahashi, E.; Kudo, K.; Akaho, M.; Okado, H. Method of Improving Properties of p-Vinylphenol Polymers. Jpn. Kokai Tokkyo Koho 01,103,604, 1989.
-
Method of Improving Properties of P-Vinylphenol Polymers
-
-
Ozawa, N.1
Matsumoto, T.2
Takahashi, E.3
Kudo, K.4
Akaho, M.5
Okado, H.6
-
17
-
-
0021446349
-
Novolak Resins Used in Positive Resist Systems
-
Pampalone, T. R. Novolak Resins Used in Positive Resist Systems. Solid State Technol. 1984, 115.
-
(1984)
Solid State Technol.
, pp. 115
-
-
Pampalone, T.R.1
-
19
-
-
0019898413
-
Structural Composition of Polymers Relative to Their Plasma Etch Characteristics
-
Pederson, L. A. Structural Composition of Polymers Relative to Their Plasma Etch Characteristics. J. Electrochem. Soc. Solid State Sci. Technol. 1982, 129 (1), 205.
-
(1982)
J. Electrochem. Soc. Solid State Sci. Technol.
, vol.129
, Issue.1
, pp. 205
-
-
Pederson, L.A.1
-
20
-
-
0025855515
-
Progress in DUV Resins
-
Pryzybilla, K.; Röschert, H.; Spiess, W.; Eckes, Ch.; Chatterjee, S.; Khanna, D.; Pawlowski, G.; Dammel, R. Progress in DUV Resins. Proc. SPIE Int. Soc. Opt. Eng. 1991, 1466, 174.
-
(1991)
Proc. SPIE Int. Soc. Opt. Eng.
, vol.1466
, pp. 174
-
-
Pryzybilla, K.1
Röschert, H.2
Spiess, W.3
Eckes, Ch.4
Chatterjee, S.5
Khanna, D.6
Pawlowski, G.7
Dammel, R.8
-
21
-
-
2842516167
-
-
Kyoiku Shuppan Center: Tokyo
-
Research Center of Maruzen Petrochemical Co., Ltd., Ed. Vinylphenol: Fundamentals and Applications; Kyoiku Shuppan Center: Tokyo, 1991.
-
(1991)
Vinylphenol: Fundamentals and Applications
-
-
-
22
-
-
0020909880
-
Catalytic Process in Organic Conversions
-
Anderson, J. R., Boudart, M., Eds.; Springer-Verlag: New York, Chapter 1
-
Rylander, P. N. Catalytic Process in Organic Conversions. In Catalysis: Science and Technology; Anderson, J. R., Boudart, M., Eds.; Springer-Verlag: New York, 1983; Vol. 4, Chapter 1.
-
(1983)
Catalysis: Science and Technology
, vol.4
-
-
Rylander, P.N.1
-
24
-
-
0023642013
-
On the Dissolution Kinetics of Positive Photoresists: The Secondary Structure Model
-
Templeton, M. K.; Szmanda, C. R.; Zampini, A. On the Dissolution Kinetics of Positive Photoresists: The Secondary Structure Model. Proc. SPIE Int. Soc. Opt. Eng. 1987, 771, 136.
-
(1987)
Proc. SPIE Int. Soc. Opt. Eng.
, vol.771
, pp. 136
-
-
Templeton, M.K.1
Szmanda, C.R.2
Zampini, A.3
-
25
-
-
2842612955
-
-
Eur. Pat. Appl. 401,499, 1990
-
Thackeray, J. W.; Orsula, G. W.; Sinta, R. Photoresist with Copolymer Binder. Eur. Pat. Appl. 401,499, 1990.
-
Photoresist with Copolymer Binder
-
-
Thackeray, J.W.1
Orsula, G.W.2
Sinta, R.3
-
26
-
-
0000160225
-
The Development of Chemically Amplified Positive- and Negative-tone Resist for DUV Lithography
-
Thackeray, J. W.; Adams, T.; Cronin, M. F.; Denison, M.; Fedynyshyn, T. H.; Georger, J.; Mori, J. M.; Orsula, G. W.; Sinta, R. The Development of Chemically Amplified Positive- and Negative-tone Resist for DUV Lithography. J. Photopolym. Sci. Technol. 1994, 7 (3), 619.
-
(1994)
J. Photopolym. Sci. Technol.
, vol.7
, Issue.3
, pp. 619
-
-
Thackeray, J.W.1
Adams, T.2
Cronin, M.F.3
Denison, M.4
Fedynyshyn, T.H.5
Georger, J.6
Mori, J.M.7
Orsula, G.W.8
Sinta, R.9
-
28
-
-
2842610730
-
Photo-oxidation of Poly(p-hydroxystyrene)
-
Weir, N. A.; Farahani, M. Photo-oxidation of Poly(p-hydroxystyrene). Makromol. Chem. 1986, 187, 889.
-
(1986)
Makromol. Chem.
, vol.187
, pp. 889
-
-
Weir, N.A.1
Farahani, M.2
-
29
-
-
0000886684
-
Quantitative Description of Dissolution and Dissolution Inhibition in Novolak and Other Phenolic Resins
-
Yeh, T. F.; Shih, H. Y.; Reiser, A.; Toukhy, M. A.; Beauchemin, B. T. Quantitative Description of Dissolution and Dissolution Inhibition in Novolak and Other Phenolic Resins. J. Vac. Sci. Technol. 1992, B10 (2), 715.
-
(1992)
J. Vac. Sci. Technol.
, vol.B10
, Issue.2
, pp. 715
-
-
Yeh, T.F.1
Shih, H.Y.2
Reiser, A.3
Toukhy, M.A.4
Beauchemin, B.T.5
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