메뉴 건너뛰기




Volumn 35, Issue 7, 1996, Pages 2414-2419

Hydrogenated poly(p-vinylphenol) for microlithography

Author keywords

[No Author keywords available]

Indexed keywords

DURABILITY; HYDROGENATION; LIGHT TRANSMISSION; MOLECULAR STRUCTURE; OPTICAL MATERIALS; PHOTORESISTS; PHOTOSENSITIVITY;

EID: 0030193804     PISSN: 08885885     EISSN: None     Source Type: Journal    
DOI: 10.1021/ie950610l     Document Type: Article
Times cited : (7)

References (29)
  • 4
    • 0026882532 scopus 로고
    • Dissolution Inhibition-type Photoresists for Deep-UV Lithography
    • Funhoff, D.; Binder, H.; Nguyen-Khim, S.; Schwalm, R. Dissolution Inhibition-type Photoresists for Deep-UV Lithography. Prog. Org. Coat. 1992, 20, 289.
    • (1992) Prog. Org. Coat. , vol.20 , pp. 289
    • Funhoff, D.1    Binder, H.2    Nguyen-Khim, S.3    Schwalm, R.4
  • 8
    • 0026258473 scopus 로고
    • Dissolution Inhibition of Phenolic Resins by Diazonaphthoquinone: Effect of Polymer Structure
    • Hattori, T.; Ueno, T.; Shiraishi, H.; Hayashi, N.; Iwayanagi, T. Dissolution Inhibition of Phenolic Resins by Diazonaphthoquinone: Effect of Polymer Structure. Jpn. J. Appl. Phys. 1991, 30 (11B), 3125.
    • (1991) Jpn. J. Appl. Phys. , vol.30 , Issue.11 B , pp. 3125
    • Hattori, T.1    Ueno, T.2    Shiraishi, H.3    Hayashi, N.4    Iwayanagi, T.5
  • 9
    • 0000538737 scopus 로고
    • Enviromentally Stable Chemical Amplification Positive Resist: Principle, Chemistry, Contamination Resistance and Lithographic Feasibility
    • Ito, H.; Breyta, G.; Hofer, D.; Sooriyakumaran, R.; Petrilo, K.; Seeger, D. Enviromentally Stable Chemical Amplification Positive Resist: Principle, Chemistry, Contamination Resistance and Lithographic Feasibility. J. Photopolym. Sci. Technol. 1994, 7 (3), 433.
    • (1994) J. Photopolym. Sci. Technol. , vol.7 , Issue.3 , pp. 433
    • Ito, H.1    Breyta, G.2    Hofer, D.3    Sooriyakumaran, R.4    Petrilo, K.5    Seeger, D.6
  • 10
    • 0011718733 scopus 로고
    • Studies on Polystyrene Monomer and Excimer Quenching by Poly(p-hydroxystyrene) in Solution
    • Jiang, Y. C.; Lucki, J.; Rabek, J. F.; Ranby, B. Studies on Polystyrene Monomer and Excimer Quenching by Poly(p-hydroxystyrene) in Solution. Makromol. Chem., Rapid Commun. 1986, 7, 563.
    • (1986) Makromol. Chem., Rapid Commun. , vol.7 , pp. 563
    • Jiang, Y.C.1    Lucki, J.2    Rabek, J.F.3    Ranby, B.4
  • 11
    • 0028479742 scopus 로고
    • Photo-Cross-Linking of Poly(4-hydroxystyrene) via Electrophilic Aromatic Substitution: Use of Polyfunctional Benzylic Alcohols in the Design of Chemically Amplified Resist Materials with Tunable Sensitivities
    • Lee, S. M.; Frechet, J. M. J.; Willson, C. G. Photo-Cross-Linking of Poly(4-hydroxystyrene) via Electrophilic Aromatic Substitution: Use of Polyfunctional Benzylic Alcohols in the Design of Chemically Amplified Resist Materials with Tunable Sensitivities. Macromolecules 1994, 27, 5154.
    • (1994) Macromolecules , vol.27 , pp. 5154
    • Lee, S.M.1    Frechet, J.M.J.2    Willson, C.G.3
  • 12
    • 0025897725 scopus 로고
    • Dissolution of Poly(p-hydroxystyrene): Molecular Weight Effects
    • Long, T.; Rodriguez, F. Dissolution of Poly(p-hydroxystyrene): Molecular Weight Effects. Proc. SPIE Int. Soc. Opt. Eng. 1991, 1466, 188.
    • (1991) Proc. SPIE Int. Soc. Opt. Eng. , vol.1466 , pp. 188
    • Long, T.1    Rodriguez, F.2
  • 14
    • 4344603802 scopus 로고
    • On the Role of Intermolecular Hydrogen Bonding in Miscible Polymer Blends
    • Moskala, E. J.; Howe, S. E.; Painter, P. C.; Coleman, M. M. On the Role of Intermolecular Hydrogen Bonding in Miscible Polymer Blends. Macromolecules 1984, 17, 1671.
    • (1984) Macromolecules , vol.17 , pp. 1671
    • Moskala, E.J.1    Howe, S.E.2    Painter, P.C.3    Coleman, M.M.4
  • 15
    • 0019556529 scopus 로고
    • Differential Scanning Calorimetric Studies on the Glass Transition Temperature of Polyhydroxystyrene Derivatives Containing Sorbed Water
    • Nakamura, K.; Hatakeyama, T.; Hatakeyama, H. Differential Scanning Calorimetric Studies on the Glass Transition Temperature of Polyhydroxystyrene Derivatives Containing Sorbed Water. Polymer 1981, 22, 473.
    • (1981) Polymer , vol.22 , pp. 473
    • Nakamura, K.1    Hatakeyama, T.2    Hatakeyama, H.3
  • 17
    • 0021446349 scopus 로고
    • Novolak Resins Used in Positive Resist Systems
    • Pampalone, T. R. Novolak Resins Used in Positive Resist Systems. Solid State Technol. 1984, 115.
    • (1984) Solid State Technol. , pp. 115
    • Pampalone, T.R.1
  • 19
    • 0019898413 scopus 로고
    • Structural Composition of Polymers Relative to Their Plasma Etch Characteristics
    • Pederson, L. A. Structural Composition of Polymers Relative to Their Plasma Etch Characteristics. J. Electrochem. Soc. Solid State Sci. Technol. 1982, 129 (1), 205.
    • (1982) J. Electrochem. Soc. Solid State Sci. Technol. , vol.129 , Issue.1 , pp. 205
    • Pederson, L.A.1
  • 21
    • 2842516167 scopus 로고
    • Kyoiku Shuppan Center: Tokyo
    • Research Center of Maruzen Petrochemical Co., Ltd., Ed. Vinylphenol: Fundamentals and Applications; Kyoiku Shuppan Center: Tokyo, 1991.
    • (1991) Vinylphenol: Fundamentals and Applications
  • 22
    • 0020909880 scopus 로고
    • Catalytic Process in Organic Conversions
    • Anderson, J. R., Boudart, M., Eds.; Springer-Verlag: New York, Chapter 1
    • Rylander, P. N. Catalytic Process in Organic Conversions. In Catalysis: Science and Technology; Anderson, J. R., Boudart, M., Eds.; Springer-Verlag: New York, 1983; Vol. 4, Chapter 1.
    • (1983) Catalysis: Science and Technology , vol.4
    • Rylander, P.N.1
  • 24
    • 0023642013 scopus 로고
    • On the Dissolution Kinetics of Positive Photoresists: The Secondary Structure Model
    • Templeton, M. K.; Szmanda, C. R.; Zampini, A. On the Dissolution Kinetics of Positive Photoresists: The Secondary Structure Model. Proc. SPIE Int. Soc. Opt. Eng. 1987, 771, 136.
    • (1987) Proc. SPIE Int. Soc. Opt. Eng. , vol.771 , pp. 136
    • Templeton, M.K.1    Szmanda, C.R.2    Zampini, A.3
  • 28
    • 2842610730 scopus 로고
    • Photo-oxidation of Poly(p-hydroxystyrene)
    • Weir, N. A.; Farahani, M. Photo-oxidation of Poly(p-hydroxystyrene). Makromol. Chem. 1986, 187, 889.
    • (1986) Makromol. Chem. , vol.187 , pp. 889
    • Weir, N.A.1    Farahani, M.2
  • 29
    • 0000886684 scopus 로고
    • Quantitative Description of Dissolution and Dissolution Inhibition in Novolak and Other Phenolic Resins
    • Yeh, T. F.; Shih, H. Y.; Reiser, A.; Toukhy, M. A.; Beauchemin, B. T. Quantitative Description of Dissolution and Dissolution Inhibition in Novolak and Other Phenolic Resins. J. Vac. Sci. Technol. 1992, B10 (2), 715.
    • (1992) J. Vac. Sci. Technol. , vol.B10 , Issue.2 , pp. 715
    • Yeh, T.F.1    Shih, H.Y.2    Reiser, A.3    Toukhy, M.A.4    Beauchemin, B.T.5


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.