Improvements in focused ion beam micromachining of interconnect materials

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 20, Issue 6, 2002, Pages 2700-2704

  Gonzalez, J C ^a   Da Silva, M I N ^a   Griffis, D P ^a   Russell, P E ^a  

^a NORTH CAROLINA STATE UNIVERSITY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

COPPER; CRYSTAL STRUCTURE; INTEGRATED CIRCUIT LAYOUT; INTEGRATED CIRCUIT MANUFACTURE; MICROMACHINING; OPTICAL INTERCONNECTS; PERMITTIVITY; PROCESS CONTROL; SILICA; SILICON COMPOUNDS; SPUTTERING; THIN FILMS;

COPPER INTERCONNECTS; FOCUSED ION BEAM; POLAR ALCOHOLS; SINGLE CRYSTAL SPUTTERING;

ION BEAMS;

EID: 0036883143     PISSN: 0734211X     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.1515310     Document Type: Article

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