Aberrations are a big part of OPC for phase-shifting masks

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 4562 II, Issue , 2001, Pages 1077-1086

  Gennari, Frank E ^a   Neureuther, Andrew R ^a  

^a UNIVERSITY OF CALIFORNIA   (United States)

Author keywords

Aberration; Layout; Optical imaging; Pattern matching; Projection printing

Indexed keywords

ABERRATIONS; ALGORITHMS; COMPUTER AIDED DESIGN; COMPUTER SIMULATION; DATA STRUCTURES; FOURIER TRANSFORMS; IMAGING SYSTEMS; PATTERN MATCHING;

OPTICAL PROXIMITY CORRECTIONS (OPC);

MASKS;

EID: 0035767786     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.458272     Document Type: Conference Paper

References (10)

1. Mark Terry, Private Communication, March 2001.
2. C.M. Garza, et al., "Ring test aberration determination and device lithography correlation," pp.36-44, Proc. SPIE vol. 4345, pp.36-44, 2000.
3. G. Robins, A.R. Neureuther, K. Adam, "Measuring optical image aberrations with pattern and probe based targets," J. Vac. Sci. Technol. B, to appear, Nov./Dec., 2001.
4. H. Fukuda, K. Hayano and S. Shirai, "Determination of high-order lens aberrations using phase/amplitude linear algebra," J. Vac Sci. Technol. B. 17(6), pp. 3318-3321, Nov./Dec. 1999.
5. A.R. Neureuther, P. Flanner III and S. Shen, "Coherence of defect interactions with features in optical imaging," J. Vac. Sci. Technol. B, pp. 308-312, Jan./Feb. 1987.
6. th Ed, Section 9.4, Cambridge Press, 1999.
7. T.A. Brunner, IBM J. Res. Develop, 41, 57, 1997.
8. J. Kirk, "Review of photoresist-based lens evaluation methods," Proc. SPIE vol. 4000, pp. 2, 2000.
9. K.H. Toh and A.R. Neureuther, Proc SPIE vol. 772, pp. 202, 1987.
10. SEM courtesy of photolithography section of M. Hanratty.