The characteristics of TiN films deposited by cyclic chemical vapor deposition

Journal of the Korean Physical Society

Volumn 35, Issue SUPPL. 4, 1999, Pages

  Uhm, Jangwoong ^a   Lee, Sangsoo ^a   Lee, Junewoo ^a   Kim, Young Do ^a   Jeon, Hyeongtag ^a   Cha, Taeho ^b   Yi, Kyoungsoo ^c  

^a Hanyang University   (South Korea)

^b Semiconductor Advanced Research Division   (South Korea)

^c Genitech Inc   (South Korea)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0033273372     PISSN: 03744884     EISSN: None     Source Type: Journal    
DOI: None     Document Type: Article

References (12)

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