Thermodynamics of the formation of TiN from TiCl4-NH3-H2 on a patterned oxidized silicon substrate

Journal of the Electrochemical Society

Volumn 143, Issue 10, 1996, Pages 3251-3256

  Bouteville, A ^a   Imhoff, L ^a   Remy, J C ^a  

^a Lab de Physico Chimie des Surfaces   (France)

Author keywords

[No Author keywords available]

Indexed keywords

AMMONIA; CALCULATIONS; CHEMICAL VAPOR DEPOSITION; FILM GROWTH; HYDROGEN; SILICON NITRIDE; SUBSTRATES; THERMODYNAMICS;

GASEOUS PHASE; OXIDIZED SILICON SUBSTRATE; SILICON OXIDE; TITANIUM CHLORIDE; TITANIUM DISILICIDE;

TITANIUM NITRIDE;

EID: 0030262515     PISSN: 00134651     EISSN: None     Source Type: Journal    
DOI: 10.1149/1.1837193     Document Type: Article

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