A mass spectrometric study of reaction mechanisms in chemical vapor deposition of (Ba, Sr)TiO3 films

Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers

Volumn 36, Issue 4 SUPPL. B, 1997, Pages 2555-2560

  Yamamuka, Mikio ^a   Kawahara, Takaaki ^a   Horikawa, Tsuyoshi ^a   Ono, Kouichi ^a  

^a MITSUBISHI ELECTRIC CORPORATION   (Japan)

Author keywords

(Ba, Sr)TiO3; CVD; DRAM; Quadruple mass spectrometry; Sr(DPM)2; Sticking probability; TiO(DPM)2; Trench coverage

Indexed keywords

BARIUM STRONTIUM TITANATE; DYNAMIC RANDOM ACCESS MEMORY (DRAM); QUADRUPLE MASS SPECTROMETERS (QMS);

BARIUM COMPOUNDS; CHEMICAL VAPOR DEPOSITION; MASS SPECTROMETRY; PYROLYSIS; RANDOM ACCESS STORAGE; REACTION KINETICS;

DIELECTRIC FILMS;

EID: 0031125983     PISSN: 00214922     EISSN: None     Source Type: Journal    
DOI: 10.1143/jjap.36.2555     Document Type: Article

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