Growth of electromigration-induced hillocks in Al interconnects

Journal of Materials Research

Volumn 17, Issue 10, 2002, Pages 2727-2735

  Nucci, J A ^a   Straub, A ^a   Bischoff, E ^a   Arzt, E ^a   Volkert, C A ^a  

^a MAX PLANCK INSTITUTE FOR INTELLIGENT SYSTEMS   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

CRYSTAL ORIENTATION; ELECTROMIGRATION; EPITAXIAL GROWTH; GRAIN GROWTH; INTERFACES (MATERIALS); MOLECULAR DYNAMICS; POLYCRYSTALLINE MATERIALS; SURFACE PROPERTIES;

COLUMNAR GRAINS; ELECTROMIGRATION-INDUCED HILLOCKS; WEDGELIKE HILLOCKS;

ALUMINUM;

EID: 0036804210     PISSN: 08842914     EISSN: None     Source Type: Journal    
DOI: 10.1557/JMR.2002.0394     Document Type: Article

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