Post-deposition reduction of internal stress in thin films: The case of HfN coatings bombarded with Au ions

Materials Letters

Volumn 33, Issue 1-2, 1997, Pages 31-36

  Nowak, R ^a   Miyagawa, Y ^b   Li, C L ^a   Nakao, S ^b   Maruno, S ^a   Miyagawa, S ^b  

^a NAGOYA INSTITUTE OF TECHNOLOGY   (Japan)

^b Natl Research Institute of Nagoya   (Japan)

Author keywords

Indentation; Internal stress; Ion bombardment; Relaxation; Thermal spikes; Thin films

Indexed keywords

AMORPHOUS FILMS; AMORPHOUS SILICON; DEFECTS; ELECTRIC CONDUCTIVITY OF SOLIDS; GOLD; HAFNIUM COMPOUNDS; ION BOMBARDMENT; RESIDUAL STRESSES; SPUTTER DEPOSITION; STRESS RELAXATION; THIN FILMS; X RAY DIFFRACTION ANALYSIS;

DEPTH SENSING INDENTATION METHOD; HAFNIUM NITRIDE;

PROTECTIVE COATINGS;

EID: 0031274630     PISSN: 0167577X     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0167-577X(97)00066-9     Document Type: Article

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