Preparation and characterization of porous silica films by a modified base-catalyzed sol-gel process containing PVA: I. The precursor solution synthesis

Journal of Sol-Gel Science and Technology

Volumn 25, Issue 2, 2002, Pages 95-101

  Liu, Y ^a,c   Chen, H ^a   Zhang, L ^b   Yao, X ^b  

^a XI'AN JIAOTONG UNIVERSITY   (China)

^b TONGJI UNIVERSITY   (China)

^c AUSTRALIAN NATIONAL UNIVERSITY   (Australia)

Author keywords

Base catalysis; Porous SiO2; Thin film

Indexed keywords

AEROGELS; CATALYSIS; CATALYSTS; CHARACTERIZATION; PERMITTIVITY; POLYVINYL ALCOHOLS; POROSITY; POROUS MATERIALS; SOL-GELS; THIN FILMS;

BASE-CATALYSIS; POROUS SILICA;

SILICA;

EID: 0036750104     PISSN: 09280707     EISSN: None     Source Type: Journal    
DOI: 10.1023/A:1019923225858     Document Type: Article

References (22)

1. K. Makita, Y. Akamatsu, A. Takamatsu, S. Yamazaki, and Y. Abe, J. Sol-Gel Sci. Technol. 14(2), 175 (1999).
2. A. Matsuda, Y. Kotani, T. Kogure, T. Umezawa, M. Tatsumisago, and T. Minami, Proc. SPIE-Int. Soc. Opt. Eng. 3943, 85 (2000).
3. J.K. Hong, H.R. Kim, and H.H. Park, Thin Solid Films 332 (1/2), 449 (1998).
4. S.V. Nitta, V. Pisupatti, A. Jain, P.C. Wayner, W.N. JrGill, and J.L. Plawsky, J. Vac. Sci. Technol. B, Microelectron. Nanometer Struct. 17(1), 205 (1999).
5. M.H. Jo, H.H. Park, D.J. Kim, S.H. Hyun, S.Y. Choi, and J.T. Paik, J. Appl. Phys. 82, 1299 (1997).
6. N. Kawakami, Y. Fukumoto, T. Kinoshita, K. Suzuki, and K. Inoue, Jpn. J. Appl. Phys. 2, Lett. 39(3A/B), L182-4 (2000).
7. E. Mitura, P. Wawizyniak, G. Rogacki, J. Szmidt, and A. Jakubowski, Diamond Relate. Mater. 3(4-6), 868 (1994).
8. J.R. Kokan and R.A. Gehardt, in Amorphous and Crystalline Insulating Thin Films-199. Symposium, Boston, USA (1997), p. 279.
9. R.C. Hughes, T.J. Boyle, T.J. Gardner, C.J. Brinker, and R. Thomas, Tranducers 97(1), 581 (1997).
10. Y. Liu, W. Ren, L.Y. Zhang, and X. Yao, in Proc. 4th Int. Conf. On Intelligent Materials, Chiba, Japan (1998), p. 288.
11. J. Li, K. Li, Y.C. Chan, and H.L.W. Choy, J. Funct. Mater. Devices 14(1), 19 (1998).
12. L.A. Chow, T. Yu, B.S. Dunn, K.N. Tu, and C. Chiang, in Low-Dielectric Constant Materials III. Symposium, San Francisco, USA (1997), p. 105.
13. J.M. Berquier, L. Teyssedre, and C. Jacquiod, J. Sol-Gel Sci. Technol. 13(1-3), 739 (1997).
14. S. Sakka, Treatise on Materials Science and Technology 22, 143 (1982).
15. R.K. Iler, The Chemistry of Silica (Wiley, New York, 1979).
16. P.J. Bruinsma, N.J. Hess, J.R. Bontha, J. Liu, and S. Baskaran, in Low-Dielectric Constant Materials II. Symposium, Boston, USA (1997), p. 105.
17. Y. Liu, W. Ren, L.Y. Zhang, and X. Yao, Thin Solid Films 353, 124 (199).
18. Y. Liu, L.Y. Zhang, X. Yao, and C.N. Xu, Materials Lett. 49, 102 (2001).
19. E.F. Vansant, P. Van Der Woort, and K.C. Vrancken, Characterization and Chemical Modification of the Silica Surface (Elsevier, Amsterdam, 1995).
20. A. Vander Zial, J. Appl. Phys. 44(2), 546 (1973).
21. C.J. Brinker and G.W. Scherer, Sol-Gel Science (Academic Press, 1990).
22. S.S. Wang, H.L. Liu, L.Y. Zhang, and X. Yao, J. Xi'an Jiaotong University 29(9), 57 (1995).