Ex situ and in situ methods for oxide and carbon removal from AlN and GaN surfaces

Materials Research Society Symposium - Proceedings

Volumn 395, Issue , 1996, Pages 739-744

  King, Sean W ^a   Smith, Laura L ^a   Barnak, John P ^a   Ku, Ja Hum ^a   Christman, Jim A ^a   Benjamin, Mark C ^a   Bremser, Michael D ^a   Nemanich, Robert J ^a   Davis, Robert F ^a  

^a NORTH CAROLINA STATE UNIVERSITY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

AUGER ELECTRON SPECTROSCOPY; CARBON; CHEMICAL CLEANING; HALOGEN ELEMENTS; HYDROCARBONS; NITRIDES; OXIDATION; OXIDES; REMOVAL; SURFACES; TEMPERATURE PROGRAMMED DESORPTION; X RAY PHOTOELECTRON SPECTROSCOPY;

ALUMINUM NITRIDE; GALLIUM NITRIDE; IN SITU REMOTE HYDROGEN PLASMA EXPOSURE; INTERFACE STATES DENSITY; OXIDE GROWTH; SURFACE DANGLING BONDS; SURFACE STOICHIOMETRY;

SURFACE CLEANING;

EID: 0029747742     PISSN: 02729172     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper

References (21)