Prepared low stress cubic boron nitride film by physical vapor deposition

Journal of Solid State Chemistry

Volumn 167, Issue 2, 2002, Pages 420-424

  Zhu, P W ^a   Zhao, Y N ^a   Wang, B ^a   He, Z ^a   Li, D M ^a   Zou, G T ^a  

^a JILIN UNIVERSITY   (China)

Author keywords

Cubic boron nitride; Internal stress; IR spectroscopy

Indexed keywords

BORON DERIVATIVE; BORON NITRIDE; UNCLASSIFIED DRUG;

ARTICLE; FILM; FOURIER TRANSFORMATION; INFRARED SPECTROSCOPY; MICROWAVE OVEN; PHYSICAL CHEMISTRY; RADIOFREQUENCY; STRESS; TRANSMISSION ELECTRON MICROSCOPY; VAPOR;

EID: 0036739850     PISSN: 00224596     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0022-4596(02)99647-7     Document Type: Article

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