Modeling thermal CVD

Journal of Chemical Engineering of Japan

Volumn 35, Issue 8, 2002, Pages 701-713

  Akiyama, Yasunobu ^a  

^a KYUSHU UNIVERSITY   (Japan)

Author keywords

Chemical Vapor Deposition; Computational Simulation; Growth Rate; Reaction Scheme; Step Coverage

Indexed keywords

COMPOSITION; COMPUTER SIMULATION; FILM GROWTH; PROBLEM SOLVING; RATE CONSTANTS; SYNTHESIS (CHEMICAL); THIN FILMS;

TUBULAR REACTORS;

CHEMICAL VAPOR DEPOSITION;

CHEMICAL REACTION; CHEMICAL VAPOR DEPOSITION; FILM; INDUSTRIAL APPLICATION; POWDER;

EID: 0036696382     PISSN: 00219592     EISSN: None     Source Type: Journal    
DOI: 10.1252/jcej.35.701     Document Type: Review

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