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Kagaku Kogaku Ronbunshu
Volumn 25, Issue 3, 1999, Pages 471-
Coverage simulation for non-liner surface reaction
Author keywords

CVD; Non linear surface reaction; Step hole coverage; Tungsten
Indexed keywords

EID: 22644451445     PISSN: 0386216X     EISSN: None     Source Type: Journal    
DOI: 10.1252/kakoronbunshu.25.466     Document Type: Article
Times cited : (2)
References (10)
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    • Akiyama, Y.1    Imaishi, N.2
  • 2
    • 0029409032 scopus 로고
    • Shape of film grown on microsize trenches and holes by chemical vapor deposition - 3-dimensional Monte Cairo simulation
    • Akiyama, Y., S. Matsumura and N. Imaishi ; "Shape of Film Grown on Microsize Trenches and Holes by Chemical Vapor Deposition - 3-Dimensional Monte Cairo Simulation-," Jpn. J. Appl. Phys., 34, 6171-6177 (1995)
    • (1995) Jpn. J. Appl. Phys. , vol.34 , pp. 6171-6177
    • Akiyama, Y.1    Matsumura, S.2    Imaishi, N.3
  • 3
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    • Step coverage simulation and mesurment in a DC planner magnetron sputtering system
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    • (1983) J. Appl. Phys. , vol.51 , pp. 3489-3496
    • Bleck, I.A.1    Vander Plas, H.A.2
  • 4
    • 0025207383 scopus 로고
    • Prediction of step coverage during blanket CVD tungsten deposition in cylindrical pores
    • Chatterjee, S. and C. M. McConica ; "Prediction of Step Coverage during Blanket CVD Tungsten Deposition in Cylindrical Pores," J. Electrochem. Soc., 137, 328-335 (1990)
    • (1990) J. Electrochem. Soc. , vol.137 , pp. 328-335
    • Chatterjee, S.1    McConica, C.M.2
  • 5
    • 0028498145 scopus 로고
    • Simulation of rare gas transport and profile evolution in nonplanar substrate chemical vapor deposition
    • Cronell, D. G. and K. F. Jensen ; "Simulation of Rare Gas Transport and Profile Evolution in Nonplanar Substrate Chemical Vapor Deposition," J. Electrochem. Soc., 141, 2545-2551 (1994)
    • (1994) J. Electrochem. Soc. , vol.141 , pp. 2545-2551
    • Cronell, D.G.1    Jensen, K.F.2
  • 6
    • 0010533868 scopus 로고    scopus 로고
    • A model with surface reaction and gas transport for tungsten CVD
    • Tokyo, Japan
    • Hayakawa, K., M. Kimura and Y. Chiba ; "A Model with Surface Reaction and Gas Transport for Tungsten CVD," Conf. Proc. ULSI XI, p. 497-503, Tokyo, Japan (1996)
    • (1996) Conf. Proc. ULSI XI , pp. 497-503
    • Hayakawa, K.1    Kimura, M.2    Chiba, Y.3
  • 7
    • 0024755516 scopus 로고
    • Deposition profile simulation using the direct simulation Monte Carlo method
    • Ikegawa, M. and J. Kobayashi ; "Deposition Profile Simulation Using the Direct Simulation Monte Carlo Method," J. Electorochem. Soc., 136, 2982-2986 (1989)
    • (1989) J. Electorochem. Soc. , vol.136 , pp. 2982-2986
    • Ikegawa, M.1    Kobayashi, J.2
  • 9
    • 0021471814 scopus 로고
    • Plasma-deposited thin-film step coverage calculated by computer simulation
    • Ross, R. C. and J. L. Vossen ; "Plasma-Deposited Thin-Film Step Coverage Calculated by Computer Simulation," Appl. Phys. Lett., 45, 239-240 (1984)
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    • Ross, R.C.1    Vossen, J.L.2
  • 10
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    • A two-dimensional step coverage boundary element model with consideration of moving deposition fronts
    • Tsai, C. Y. and S. B. Dseu ; "A Two-Dimensional Step Coverage Boundary Element Model with Consideration of Moving Deposition Fronts," J. Electrochem. Soc., 140, 2128-2133 (1993)
    • (1993) J. Electrochem. Soc. , vol.140 , pp. 2128-2133
    • Tsai, C.Y.1    Dseu, S.B.2

* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.