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Thin Solid Films

Volumn 415, Issue 1-2, 2002, Pages 177-186

The effect of ion beam bombardment on the properties of Ta(C)N films deposited from pentakis-diethylamido-tantalum

(3) Kim, Soo Hyun a Im, Se Joon a Kim, Ki Bum a

a Seoul National University (South Korea)

Author keywords

Chemical vapor deposition; Copper metallization; Ion bombardment; TaCN; TaN

Indexed keywords

ANNEALING; CHEMICAL VAPOR DEPOSITION; COPPER METALLOGRAPHY; DECOMPOSITION; DIFFUSION; ELECTRIC CONDUCTIVITY; ION BOMBARDMENT; TANTALUM CARBIDE; X RAY DIFFRACTION ANALYSIS;

FILM DEPOSITION;

THIN FILMS;

EID: 0036671496 PISSN: 00406090 EISSN: None Source Type: Journal
DOI: 10.1016/S0040-6090(02)00505-9 Document Type: Article

Times cited : (14)

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