Scanning probe microscope lithography of silicon using a combination of a carbon nanotube tip and a polysilane film as a mask

Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers

Volumn 41, Issue 7 B, 2002, Pages 4973-4975

  Okazaki, Ai ^a   Akita, Seiji ^a   Nakayama, Yoshikazu ^a  

^a Osaka Prefecture University   (Japan)

Author keywords

Carbon nanotube; Polysilane; Si lithography; SPM lithography

Indexed keywords

CARBON NANOTUBES; DEGRADATION; ETCHING; MASKS; NANOTECHNOLOGY; OPTICAL MICROSCOPY; PHOTOLITHOGRAPHY; POLYSILANES; THICK FILMS;

SCANNING PROBE MICROSCOPE LITHOGRAPHY;

SEMICONDUCTING SILICON;

EID: 0036657477     PISSN: 00214922     EISSN: None     Source Type: Journal    
DOI: 10.1143/jjap.41.4973     Document Type: Conference Paper

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