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Journal of Materials Research

Volumn 17, Issue 7, 2002, Pages 1692-1697

Electron cyclotron resonance plasma-assisted reactive pulsed laser deposition of compound films

(6) Sun, J a Wu, J D a Ling, H a Shi, W a Ying, Z F a Li, F M a

a FUDAN UNIVERSITY (China)

Author keywords

[No Author keywords available]

Indexed keywords

ALUMINUM NITRIDE; ELECTRON CYCLOTRON RESONANCE; FILM GROWTH; FILM PREPARATION; LOW TEMPERATURE EFFECTS; PULSED LASER DEPOSITION; SILICA;

COMPOUND FILMS;

THIN FILMS;

EID: 0036649595 PISSN: 08842914 EISSN: None Source Type: Journal
DOI: 10.1557/JMR.2002.0249 Document Type: Article

Times cited : (5)

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* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.