Two-photon exposure of photographic film

Journal of the Optical Society of America B: Optical Physics

Volumn 16, Issue 4, 1999, Pages 605-608

  Wu, Pu Wei ^a   Dunn, Bruce ^a   Yablonovitch, Eli ^b   Doan, Vinh ^b   Schwartz, Benjamin J ^b  

^a Engineering IV   (United States)

^b UNIVERSITY OF CALIFORNIA   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0033464034     PISSN: 07403224     EISSN: None     Source Type: Journal    
DOI: 10.1364/JOSAB.16.000605     Document Type: Article

References (10)

1. Kirk-Othmer, ed., Encyclopedia of Chemical Technology (Wiley, New York 1978), Vol. 17, p. 611.
2. E. Yablonovitch and R. B. Vrijen, "Optical projection lithography at half the Rayleigh resolution limit by two photon exposure," Opt. Eng. (Bellingham) (to be published).
3. S. Maruo, O. Nakamura, and S. Kawata, "Three-dimensional microfabrication with two-photon-absorbed photopolymerization," Opt. Lett. 22, 132-134 (1997); E. S. Wu, J. H. Strickler, W. R. Harrell, and W. W. Webb, "Two-photon lithography for microelectronic application," in Optical/Laser Microlithography V, J. J. D. Cuthbert, ed., Proc. SPIE 1674, 776-782 (1992); J. H. Strickler and W. W. Webb, "Three-dimensional optical data storage in refractive media by 2-photon point excitation," Opt. Lett. 16, 1780-1782 (1991).
4. S. Maruo, O. Nakamura, and S. Kawata, "Three-dimensional microfabrication with two-photon-absorbed photopolymerization," Opt. Lett. 22, 132-134 (1997); E. S. Wu, J. H. Strickler, W. R. Harrell, and W. W. Webb, "Two-photon lithography for microelectronic application," in Optical/Laser Microlithography V, J. J. D. Cuthbert, ed., Proc. SPIE 1674, 776-782 (1992); J. H. Strickler and W. W. Webb, "Three-dimensional optical data storage in refractive media by 2-photon point excitation," Opt. Lett. 16, 1780-1782 (1991).
5. S. Maruo, O. Nakamura, and S. Kawata, "Three-dimensional microfabrication with two-photon-absorbed photopolymerization," Opt. Lett. 22, 132-134 (1997); E. S. Wu, J. H. Strickler, W. R. Harrell, and W. W. Webb, "Two-photon lithography for microelectronic application," in Optical/Laser Microlithography V, J. J. D. Cuthbert, ed., Proc. SPIE 1674, 776-782 (1992); J. H. Strickler and W. W. Webb, "Three-dimensional optical data storage in refractive media by 2-photon point excitation," Opt. Lett. 16, 1780-1782 (1991).
6. I. M. Catalano, A. Cingolani, and M. Lepore, "Two-photon absorption spectra of direct and indirect materials: ZnO and AgCl," Phys. Rev. B 33, 7270-7273 (1986).
7. M. Casalboni, F. Crisanti, R. Francini, and U. M. Grassano, "Two-photon spectroscopy in AgCl," Solid State Commun. 35, 833-836 (1980).
8. Commercial film, Kodak technical data publication F-16 (Eastman Kodak, Rochester, N.Y.).
9. AZO photographic paper, Kodak technical data publication G-10 (Eastman Kodak, Rochester, N.Y.).
10. J. Kruger and W. Kautek, "Femtosecond-pulse visible laser processing of transparent materials," Appl. Surf. Sci. 96-98, 430-438 (1996).