Process integration of 20 nm electron beam lithography and nanopatterning for ultimate MOSFET device fabrication

Microelectronic Engineering

Volumn 61-62, Issue , 2002, Pages 607-612

  Kretz, J ^a   Dreeskornfeld, L ^a,b  

^a INFINEON TECHNOLOGIES AG   (Germany)

^b TECHNICAL UNIVERSITY OF MUNICH   (Germany)

Author keywords

Calixarene; Electron beam lithography; Nanoetching; Ultimate MOSFET

Indexed keywords

BROMINE; CHLORINE; ELECTRON BEAM LITHOGRAPHY; ETCHING; FABRICATION; RADIATION DAMAGE;

ORGANIC RESIST CALIXARENE;

MOSFET DEVICES;

EID: 0036643936     PISSN: 01679317     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0167-9317(02)00434-3     Document Type: Conference Paper

References (7)