A sensitive positive resist for 0.1-μm electron-beam direct-writing lithography

Journal of Photopolymer Science and Technology

Volumn 10, Issue 4, 1997, Pages 625-628

  Arai, Tadashi ^a   Sakamizu, Toshio ^a   Katoh, Kohji ^a   Hashimoto, Michiaki ^a   Shiraishi, Hiroshi ^a  

^a HITACHI LTD   (Japan)

Author keywords

Alkyl onium iodides; Diffusion monitoring layer; Electron beam; Nobolak

Indexed keywords

EID: 0001143908     PISSN: 09149244     EISSN: None     Source Type: Journal    
DOI: 10.2494/photopolymer.10.625     Document Type: Article

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