Growth of diamond films on crystalline silicon by hot-filament chemical vapor deposition

Semiconductors

Volumn 36, Issue 6, 2002, Pages 615-620

  Baidakova, M V ^a   Vul’, A Ya ^a   Golubev, V G ^a   Grudinkin, S A ^a   Melekhin, V G ^a   Feoktistov, N A ^a   Kruger A ^b  

^a IOFFE INSTITUTE   (Russian Federation)

^b TOYOHASHI UNIVERSITY OF TECHNOLOGY   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0036624230     PISSN: 10637826     EISSN: None     Source Type: Journal    
DOI: 10.1134/1.1485657     Document Type: Article

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