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Volumn 41, Issue 16, 2002, Pages 3236-3241

High-performance deep-ultraviolet optics for free-electron lasers

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EID: 0036603101     PISSN: 1559128X     EISSN: 21553165     Source Type: Journal    
DOI: 10.1364/AO.41.003236     Document Type: Article
Times cited : (36)

References (33)
  • 4
    • 0032640740 scopus 로고    scopus 로고
    • The OK-4/Duke storage ring FEL lasing in the deep-UV
    • V. Litvinenko, “The OK-4/Duke storage ring FEL lasing in the deep-UV,” Nucl. Instrum. Methods Phys. Res. A 429, 151-158 (1999).
    • (1999) Nucl. Instrum. Methods Phys. Res. A , vol.429 , pp. 151-158
    • Litvinenko, V.1
  • 7
    • 0028428389 scopus 로고
    • First use of the UV super-ACO free-electron laser: Fluorescence decays and rotational dynamics of the NADH coenzyme
    • M. E. Couprie, F. Merola, P. Tauc, D. Garzella, A. Delboulbe, T. Hara, and M. Billardon, “First use of the UV super-ACO free-electron laser: fluorescence decays and rotational dynamics of the NADH coenzyme,” Rev. Sci. Instrum. 65, 1485-1495 (1994).
    • (1994) Rev. Sci. Instrum. , vol.65 , pp. 1485-1495
    • Couprie, M.E.1    Merola, F.2    Tauc, P.3    Garzella, D.4    Delboulbe, A.5    Hara, T.6    Billardon, M.7
  • 9
    • 85010150743 scopus 로고    scopus 로고
    • From the operation of an SRFEL to a user facility
    • to be published
    • M. Hosaka, “From the operation of an SRFEL to a user facility,” Nucl. Instrum. Methods Phys. Res. A (to be published).
    • Nucl. Instrum. Methods Phys. Res. A
    • Hosaka, M.1
  • 11
    • 84956094658 scopus 로고
    • The Super-ACO FEL operation with shorter positron bunches
    • M. E. Couprie, D. Garzella, and M. Billardon, “The Super-ACO FEL operation with shorter positron bunches,” Europhys. Lett. 21, 909-914 (1993).
    • (1993) Europhys. Lett. , vol.21 , pp. 909-914
    • Couprie, M.E.1    Garzella, D.2    Billardon, M.3
  • 18
    • 0017456546 scopus 로고
    • Use of hafnium dioxide in multilayer dielectric reflectors for the near UV
    • P. Baumeister and O. Arnon, “Use of hafnium dioxide in multilayer dielectric reflectors for the near UV,” Appl. Opt. 16, 439-444 (1977).
    • (1977) Appl. Opt. , vol.16 , pp. 439-444
    • Baumeister, P.1    Arnon, O.2
  • 19
    • 0032691256 scopus 로고    scopus 로고
    • Advantages of evaporation of hafnium in a reactive environment for manufacture of high-damage threshold multilayer coatings by electron beam evaporation
    • C. Amra and A. Macleod, eds., Proc. SPIE
    • C. J. Stolz, L. M. Sheehan, M. K. von Gunten, R. P. Bevis, and D. J. Smith, “Advantages of evaporation of hafnium in a reactive environment for manufacture of high-damage threshold multilayer coatings by electron beam evaporation,” in Advances in Optical Interference Coatings, C. Amra and A. Macleod, eds., Proc. SPIE 3738, 318-324 (1999).
    • (1999) Advances in Optical Interference Coatings , vol.3738 , pp. 318-324
    • Stolz, C.J.1    Sheehan, L.M.2    Von Gunten, M.K.3    Bevis, R.P.4    Smith, D.J.5
  • 20
    • 0026202438 scopus 로고
    • Optical and microstructural properties of hafnium dioxide thin films
    • J. P. Lehan, Y. Mao, B. G. Bovard, and H. A. McLeod, “Optical and microstructural properties of hafnium dioxide thin films,” Thin Solid Films 203, 227-250 (1991).
    • (1991) Thin Solid Films , vol.203 , pp. 227-250
    • Lehan, J.P.1    Mao, Y.2    Bovard, B.G.3    Mc Leod, H.A.4
  • 21
    • 0032628330 scopus 로고    scopus 로고
    • Study of HfO2 films prepared by ion-assisted deposition using a gridless end-hall ion source
    • 2films prepared by ion-assisted deposition using a gridless end-hall ion source,” Thin Solid Films 350, 203-208 (1999).
    • (1999) Thin Solid Films , vol.350 , pp. 203-208
    • Gilo, M.1    Croitoru, N.2
  • 22
    • 0033366037 scopus 로고    scopus 로고
    • Structural and optical modification in hafnium oxide thin films related to the momentum parameter transferred by ion beam assistance
    • M. Alvisi, S. Scaglione, S. Martelli, A. Rizzo, and L. Vasanelli, “Structural and optical modification in hafnium oxide thin films related to the momentum parameter transferred by ion beam assistance,” Thin Solid Films 354, 19-23 (1999).
    • (1999) Thin Solid Films , vol.354 , pp. 19-23
    • Alvisi, M.1    Scaglione, S.2    Martelli, S.3    Rizzo, A.4    Vasanelli, L.5
  • 23
    • 0032635461 scopus 로고    scopus 로고
    • Dependence of the HfO2 thin film structure on the momentum transfer in ion beam assisted deposition
    • G. J. Exarhos, A. H. Guenther, M. R. Kozlowski, K. L. Lewis, and M. J. Soileau, eds., Proc. SPIE
    • 2thin film structure on the momentum transfer in ion beam assisted deposition,” in Laser-Induced Damage in Optical Materials: 1998, G. J. Exarhos, A. H. Guenther, M. R. Kozlowski, K. L. Lewis, and M. J. Soileau, eds., Proc. SPIE 3578, 154-161 (1999).
    • (1999) Laser-Induced Damage in Optical Materials: 1998 , vol.3578 , pp. 154-161
    • Scaglione, S.1    Sarto, F.2    Rizzo, A.3    Alvisi, M.4
  • 24
    • 85076480938 scopus 로고
    • Plasma ion-assisted deposition: A novel technique for the production of optical coatings
    • F. Abeles, ed., Proc. SPIE
    • A. Zoller, S. Beisswenger, R. Gotzelmann, and K. Matl, “Plasma ion-assisted deposition: a novel technique for the production of optical coatings,” in Optical Interference Coatings, F. Abeles, ed., Proc. SPIE 2253, 394-402 (1994).
    • (1994) Optical Interference Coatings , vol.2253 , pp. 394-402
    • Zoller, A.1    Beisswenger, S.2    Gotzelmann, R.3    Matl, K.4
  • 25
    • 0006160255 scopus 로고    scopus 로고
    • High-reflectivity dense UV mirrors
    • of OSA Trends in Optics and Photonics (Optical Society of America, Washington, D.C.,)
    • P. Torchio, A. Gatto, M. Alvisi, G. Albrand, N. Kaiser, and C. Amra, “High-reflectivity dense UV mirrors,” in Optical Interference Coatings, Vol. 63 of OSA Trends in Optics and Photonics (Optical Society of America, Washington, D.C., 2001), pp. ThA7-1-ThA7-3.
    • (2001) Optical Interference Coatings , vol.63 , pp. ThA7-1-ThA7-3
    • Torchio, P.1    Gatto, A.2    Alvisi, M.3    Albrand, G.4    Kaiser, N.5    Amra, C.6
  • 27
    • 0032679794 scopus 로고    scopus 로고
    • Changes in optical interference coatings exposed to 193 nm excimer laser radiation
    • G. J. Exarhos, A. H. Guenther, M. R. Kozlowski, K. L. Lewis, and M. J. Soileau, eds., Proc. SPIE
    • J. Heber, R. Thielsch, H. Blaschke, N. Kaiser, U. Leinhos, and A. Gortler, “Changes in optical interference coatings exposed to 193 nm excimer laser radiation,” in Laser-Induced Damage in Optical Materials: 1998, G. J. Exarhos, A. H. Guenther, M. R. Kozlowski, K. L. Lewis, and M. J. Soileau, eds., Proc. SPIE 3578, 83-96 (1999).
    • (1999) Laser-Induced Damage in Optical Materials: 1998 , vol.3578 , pp. 83-96
    • Heber, J.1    Thielsch, R.2    Blaschke, H.3    Kaiser, N.4    Leinhos, U.5    Gortler, A.6
  • 28
    • 58149316379 scopus 로고    scopus 로고
    • Nano absorbing centers: A key point in laser damage thin films
    • H. E. Bennett, A. H. Guenther, M. R. Kozlowski, B. E. Newnam, and M. J. Soileau, eds., Proc. SPIE
    • J. Dijon, T. Poiroux, and C. Desrumaux, “Nano absorbing centers: a key point in laser damage thin films,” in Laser-Induced Damage in Optical Materials: 1996, H. E. Bennett, A. H. Guenther, M. R. Kozlowski, B. E. Newnam, and M. J. Soileau, eds., Proc. SPIE 2966, 315-325 (1996).
    • (1996) Laser-Induced Damage in Optical Materials: 1996 , vol.2966 , pp. 315-325
    • Dijon, J.1    Poiroux, T.2    Desrumaux, C.3
  • 29
    • 0032667014 scopus 로고    scopus 로고
    • European project to develop an UV/VUV FEL facility on the ELETTRA storage ring
    • R. P. Walker, “European project to develop an UV/VUV FEL facility on the ELETTRA storage ring,” Nucl. Instrum. Methods Phys. Res. A 429, 179-184 (1999).
    • (1999) Nucl. Instrum. Methods Phys. Res. A , vol.429 , pp. 179-184
    • Walker, R.P.1
  • 31
    • 0034506359 scopus 로고    scopus 로고
    • A comparative study of the UV-optical and structural properties of SiO2, Al2O3, and HfO2 single layers deposited by reactive evaporation, ion assisted deposition, and plasma ion assisted deposition
    • A. J. Marker III and E. G. Arthurs, eds., Proc. SPIE
    • 2single layers deposited by reactive evaporation, ion assisted deposition, and plasma ion assisted deposition,” in Inorganic Optical Materials II, A. J. Marker III and E. G. Arthurs, eds., Proc. SPIE 4102, 276-288 (2000).
    • (2000) Inorganic Optical Materials II , vol.4102 , pp. 276-288
    • Thielsch, R.1    Gatto, A.2    Heber, J.3    Kaiser, N.4
  • 32
    • 0034498426 scopus 로고    scopus 로고
    • Si-based multilayers with high thermal stability, in soft x-ray and EUV imaging systems
    • W. M. Kaiser and R. H. Stulen, eds., Proc. SPIE
    • N. Kaiser, S. Yulin, and T. Feigl, “Si-based multilayers with high thermal stability, in soft x-ray and EUV imaging systems,” in Soft X-Ray and EUVImaging Systems, W. M. Kaiser and R. H. Stulen, eds., Proc. SPIE 4146, 91-100 (2000).
    • (2000) Soft X-Ray and Euvimaging Systems , vol.4146 , pp. 91-100
    • Kaiser, N.1    Yulin, S.2    Feigl, T.3
  • 33
    • 0035450636 scopus 로고    scopus 로고
    • Heat resistance of EUV multilayer mirrors for long-time applications
    • T. Feigl, H. Lauth, S. Yulin, and N. Kaiser, “Heat resistance of EUV multilayer mirrors for long-time applications,” Microelectron. Eng. 57-58, 3-8 (2001).
    • (2001) Microelectron. Eng. , vol.57-58 , pp. 3-8
    • Feigl, T.1    Lauth, H.2    Yulin, S.3    Kaiser, N.4


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