-
1
-
-
4244025573
-
First operation of a storage-ring free-electron laser
-
M. Billardon, P. Elleaume, J. M. Ortega, C. Bazin, M. Bergher, M. Velghe, Y. Petroff, D. A. G. Deacon, K. E. Robinson, and J. M. J. Madey, “First operation of a storage-ring free-electron laser,” Phys. Rev. Lett. 51, 1652-1655 (1983).
-
(1983)
Phys. Rev. Lett.
, vol.51
, pp. 1652-1655
-
-
Billardon, M.1
Elleaume, P.2
Ortega, J.M.3
Bazin, C.4
Bergher, M.5
Velghe, M.6
Petroff, Y.7
Deacon, D.A.G.8
Robinson, K.E.9
Madey, J.M.J.10
-
2
-
-
0032683175
-
Lasing down to the deep UV in the NIJI-IV FEL
-
K. Yamada, N. Sei, T. Yamazaki, H. Ohgaki, V. N. Litvinenko, T. Mikado, S. Sugiyama, M. Kawai, and M. Yokoyama, “Lasing down to the deep UV in the NIJI-IV FEL,” Nucl. Instrum. Methods Phys. Res. A 429, 159-164 (1999).
-
(1999)
Nucl. Instrum. Methods Phys. Res. A
, vol.429
, pp. 159-164
-
-
Yamada, K.1
Sei, N.2
Yamazaki, T.3
Ohgaki, H.4
Litvinenko, V.N.5
Mikado, T.6
Sugiyama, S.7
Kawai, M.8
Yokoyama, M.9
-
3
-
-
0001423951
-
Lasing towards the VUV in the NIJI-IV FEL
-
K. Yamada, N. Sei, H. Ohgaki, T. Mikado, S. Sugiyama, and T. Yamazaki, “Lasing towards the VUV in the NIJI-IV FEL,” Nucl. Instrum. Methods Phys. Res. A 445, 173-177 (2000).
-
(2000)
Nucl. Instrum. Methods Phys. Res. A
, vol.445
, pp. 173-177
-
-
Yamada, K.1
Sei, N.2
Ohgaki, H.3
Mikado, T.4
Sugiyama, S.5
Yamazaki, T.6
-
4
-
-
0032640740
-
The OK-4/Duke storage ring FEL lasing in the deep-UV
-
V. Litvinenko, “The OK-4/Duke storage ring FEL lasing in the deep-UV,” Nucl. Instrum. Methods Phys. Res. A 429, 151-158 (1999).
-
(1999)
Nucl. Instrum. Methods Phys. Res. A
, vol.429
, pp. 151-158
-
-
Litvinenko, V.1
-
5
-
-
85010128633
-
Operation of the European Storage Ring FEL at ELETTRA down to 190 nm
-
to be published
-
M. Trovo, J. A. Clarke, M. E. Couprie, G. Dattoli, D. Garzella, A. Gatto, L. Giannessi, S. Gunster, N. Kaiser, M. Marsi, M. W. Poole, D. Ristau, and R. P. Walker, “Operation of the European Storage Ring FEL at ELETTRA down to 190 nm,” Nucl. Instrum. Methods Phys. Res. A (to be published).
-
Nucl. Instrum. Methods Phys. Res. A
-
-
Trovo, M.1
Clarke, J.A.2
Couprie, M.E.3
Dattoli, G.4
Garzella, D.5
Gatto, A.6
Giannessi, L.7
Gunster, S.8
Kaiser, N.9
Marsi, M.10
Poole, M.W.11
Ristau, D.12
Walker, R.P.13
-
6
-
-
0006153127
-
Completion of the first phase of development of the European UV/VUV free-electron laser at ELETTRA
-
M. Marsi, R. Roux, M. Trovò, R. P. Walker, M. E. Couprie, D. Garzella, J. A. Clarke, M. W. Poole, K. Wille, G. Dattoli, L. Giannessi, M. Eriksson, S. Werin, A. Gatto, N. Kaiser, A. Gun-ster, and D. Ristau, “Completion of the first phase of development of the European UV/VUV free-electron laser at ELETTRA,” Synchr. Rad. News 14(4), 19 (2001).
-
(2001)
Synchr. Rad. News
, vol.14
, Issue.4
, pp. 19
-
-
Marsi, M.1
Roux, R.2
Trovò, M.3
Walker, R.P.4
Couprie, M.E.5
Garzella, D.6
Clarke, J.A.7
Poole, M.W.8
Wille, K.9
Dattoli, G.10
Giannessi, L.11
Eriksson, M.12
Werin, S.13
Gatto, A.14
Kaiser, N.15
Gun-Ster, A.16
Ristau, D.17
-
7
-
-
0028428389
-
First use of the UV super-ACO free-electron laser: Fluorescence decays and rotational dynamics of the NADH coenzyme
-
M. E. Couprie, F. Merola, P. Tauc, D. Garzella, A. Delboulbe, T. Hara, and M. Billardon, “First use of the UV super-ACO free-electron laser: fluorescence decays and rotational dynamics of the NADH coenzyme,” Rev. Sci. Instrum. 65, 1485-1495 (1994).
-
(1994)
Rev. Sci. Instrum.
, vol.65
, pp. 1485-1495
-
-
Couprie, M.E.1
Merola, F.2
Tauc, P.3
Garzella, D.4
Delboulbe, A.5
Hara, T.6
Billardon, M.7
-
8
-
-
0000596631
-
Transient charge carrier distribution at UV-photoexcited SiO2/Si interfaces
-
2/Si interfaces,” Phys. Rev. B 61, R5070-3 (2000).
-
(2000)
Phys. Rev. B
, vol.61
-
-
Marsi, M.1
Belkhou, R.2
Grupp, C.3
Panaccione, G.4
Taleb-Ibrahimi, A.5
Nahon, L.6
Garzella, D.7
Nutarelli, D.8
Renault, E.9
Roux, R.10
Couprie, M.E.11
Billardon, M.12
-
9
-
-
85010150743
-
From the operation of an SRFEL to a user facility
-
to be published
-
M. Hosaka, “From the operation of an SRFEL to a user facility,” Nucl. Instrum. Methods Phys. Res. A (to be published).
-
Nucl. Instrum. Methods Phys. Res. A
-
-
Hosaka, M.1
-
10
-
-
0001405951
-
First operation of a free electron laser
-
D. A. G. Deacon, L. R. Elias, J. M. J. Madey, G. L. Ramian, H. A. Schwettman, and T. I. Smith, “First operation of a free electron laser,” Phys. Rev. Lett. 38, 892-894 (1977).
-
(1977)
Phys. Rev. Lett.
, vol.38
, pp. 892-894
-
-
Deacon, D.A.G.1
Elias, L.R.2
Madey, J.M.J.3
Ramian, G.L.4
Schwettman, H.A.5
Smith, T.I.6
-
11
-
-
84956094658
-
The Super-ACO FEL operation with shorter positron bunches
-
M. E. Couprie, D. Garzella, and M. Billardon, “The Super-ACO FEL operation with shorter positron bunches,” Europhys. Lett. 21, 909-914 (1993).
-
(1993)
Europhys. Lett.
, vol.21
, pp. 909-914
-
-
Couprie, M.E.1
Garzella, D.2
Billardon, M.3
-
12
-
-
0032209592
-
High current operation of a storage-ring free electron laser
-
R. Roux, M. E. Couprie, R. J. Bakker, D. Garzella, D. Nutarelli, L. Nahon, and M. Billardon, “High current operation of a storage-ring free electron laser,” Phys. Rev. E 58, 6584- 6593 (1998).
-
(1998)
Phys. Rev. E
, vol.58
-
-
Roux, R.1
Couprie, M.E.2
Bakker, R.J.3
Garzella, D.4
Nutarelli, D.5
Nahon, L.6
Billardon, M.7
-
13
-
-
17944365572
-
Achromatic damage investigation on mirrors for UV free electron lasers
-
G. J. Exarhos, A. H. Guenther, M. R. Kozlowski, K. L. Lewis, and M. J. Soileau, eds., Proc. SPIE
-
A. Gatto, N. Kaiser, R. Thielsch, D. Garzella, M. Hirsch, D. Nutarelli, G. De Ninno, E. Renault, M. E. Couprie, P. Torchio, M. Alvisi, G. Albrand, C. Amra, M. Marsi, Mauro Trove, R. Walker, M. Grewe, J. P. Roger, and C. Boccara, “Achromatic damage investigation on mirrors for UV free electron lasers,” in Laser-Induced Damage in Optical Materials: 2000, G. J. Exarhos, A. H. Guenther, M. R. Kozlowski, K. L. Lewis, and M. J. Soileau, eds., Proc. SPIE 4347, 535-546 (2001).
-
(2001)
Laser-Induced Damage in Optical Materials: 2000
, vol.4347
, pp. 535-546
-
-
Gatto, A.1
Kaiser, N.2
Thielsch, R.3
Garzella, D.4
Hirsch, M.5
Nutarelli, D.6
De Ninno, G.7
Renault, E.8
Couprie, M.E.9
Torchio, P.10
Alvisi, M.11
Albrand, G.12
Amra, C.13
Marsi, M.14
Trove, M.15
Walker, R.16
Grewe, M.17
Roger, J.P.18
Boccara, C.19
-
14
-
-
0027626386
-
First lasing of the NIJI-IV storagering free-electron laser
-
T. Yamazaki, K. Yamada, S. Sugiyama, H. Ohgaki, N. Sei, T. Mikado, T. Noguchi, M. Chiwaki, R. Suzuki, M. Kawai, M. Yokoyama, K. Owaki, S. Hamada, K. Aizawa, Y. Oku, A. Iwata, and M. Yoshiwa, “First lasing of the NIJI-IV storagering free-electron laser,” Nucl. Instrum. Methods Phys. Res. A 331, 27-33 (1993).
-
(1993)
Nucl. Instrum. Methods Phys. Res. A
, vol.331
, pp. 27-33
-
-
Yamazaki, T.1
Yamada, K.2
Sugiyama, S.3
Ohgaki, H.4
Sei, N.5
Mikado, T.6
Noguchi, T.7
Chiwaki, M.8
Suzuki, R.9
Kawai, M.10
Yokoyama, M.11
Owaki, K.12
Hamada, S.13
Aizawa, K.14
Oku, Y.15
Iwata, A.16
Yoshiwa, M.17
-
15
-
-
0030171244
-
Lasing at 300 nm and below: Optical challenges and perspectives
-
D. Garzella, M. E. Couprie, and M. Billardon, “Lasing at 300 nm and below: optical challenges and perspectives,” Nucl. Instrum. Methods Phys. Res. A 375, 39-45 (1996).
-
(1996)
Nucl. Instrum. Methods Phys. Res. A
, vol.375
, pp. 39-45
-
-
Garzella, D.1
Couprie, M.E.2
Billardon, M.3
-
16
-
-
0001262257
-
Toward resistant UV mirrors at 200 nm for free electron lasers: Man ufacture, characterizations, and degradation tests
-
A. J. Marker III and E. G. Arthurs, eds., Proc. SPIE
-
A. Gatto, R. Thielsch, N. Kaiser, M. Hirsch, D. Garzella, D. Nutarelli, G. de-Ninno, E. Renault, M. Couprie, P. Torchio, M. Alvisi, G. Albrand, C. Amra, M. Marsi, M. Trovo, R. Walker, M. Grewe, S. Robert, J. P. Roger, and C. A. Boccara, “Toward resistant UV mirrors at 200 nm for free electron lasers: man ufacture, characterizations, and degradation tests,” in Inorganic Optical Materials II, A. J. Marker III and E. G. Arthurs, eds., Proc. SPIE 4102, 261-75 (2000).
-
(2000)
Inorganic Optical Materials II
, vol.4102
, pp. 261-275
-
-
Gatto, A.1
Thielsch, R.2
Kaiser, N.3
Hirsch, M.4
Garzella, D.5
Nutarelli, D.6
De-Ninno, G.7
Renault, E.8
Couprie, M.9
Torchio, P.10
Alvisi, M.11
Albrand, G.12
Amra, C.13
Marsi, M.14
Trovo, M.15
Walker, R.16
Grewe, M.17
Robert, S.18
Roger, J.P.19
Boccara, C.A.20
more..
-
17
-
-
84975660029
-
Materials for optical coatings in the ultraviolet
-
F. Rainer, H. W. Lowdermilk, D. Milam, C. K. Carniglia, T. Tuttle Hart, and T. L. Lichtenstein, “Materials for optical coatings in the ultraviolet,” Appl. Opt. 24, 496-500 (1985).
-
(1985)
Appl. Opt.
, vol.24
, pp. 496-500
-
-
Rainer, F.1
Lowdermilk, H.W.2
Milam, D.3
Carniglia, C.K.4
Tuttle Hart, T.5
Lichtenstein, T.L.6
-
18
-
-
0017456546
-
Use of hafnium dioxide in multilayer dielectric reflectors for the near UV
-
P. Baumeister and O. Arnon, “Use of hafnium dioxide in multilayer dielectric reflectors for the near UV,” Appl. Opt. 16, 439-444 (1977).
-
(1977)
Appl. Opt.
, vol.16
, pp. 439-444
-
-
Baumeister, P.1
Arnon, O.2
-
19
-
-
0032691256
-
Advantages of evaporation of hafnium in a reactive environment for manufacture of high-damage threshold multilayer coatings by electron beam evaporation
-
C. Amra and A. Macleod, eds., Proc. SPIE
-
C. J. Stolz, L. M. Sheehan, M. K. von Gunten, R. P. Bevis, and D. J. Smith, “Advantages of evaporation of hafnium in a reactive environment for manufacture of high-damage threshold multilayer coatings by electron beam evaporation,” in Advances in Optical Interference Coatings, C. Amra and A. Macleod, eds., Proc. SPIE 3738, 318-324 (1999).
-
(1999)
Advances in Optical Interference Coatings
, vol.3738
, pp. 318-324
-
-
Stolz, C.J.1
Sheehan, L.M.2
Von Gunten, M.K.3
Bevis, R.P.4
Smith, D.J.5
-
20
-
-
0026202438
-
Optical and microstructural properties of hafnium dioxide thin films
-
J. P. Lehan, Y. Mao, B. G. Bovard, and H. A. McLeod, “Optical and microstructural properties of hafnium dioxide thin films,” Thin Solid Films 203, 227-250 (1991).
-
(1991)
Thin Solid Films
, vol.203
, pp. 227-250
-
-
Lehan, J.P.1
Mao, Y.2
Bovard, B.G.3
Mc Leod, H.A.4
-
21
-
-
0032628330
-
Study of HfO2 films prepared by ion-assisted deposition using a gridless end-hall ion source
-
2films prepared by ion-assisted deposition using a gridless end-hall ion source,” Thin Solid Films 350, 203-208 (1999).
-
(1999)
Thin Solid Films
, vol.350
, pp. 203-208
-
-
Gilo, M.1
Croitoru, N.2
-
22
-
-
0033366037
-
Structural and optical modification in hafnium oxide thin films related to the momentum parameter transferred by ion beam assistance
-
M. Alvisi, S. Scaglione, S. Martelli, A. Rizzo, and L. Vasanelli, “Structural and optical modification in hafnium oxide thin films related to the momentum parameter transferred by ion beam assistance,” Thin Solid Films 354, 19-23 (1999).
-
(1999)
Thin Solid Films
, vol.354
, pp. 19-23
-
-
Alvisi, M.1
Scaglione, S.2
Martelli, S.3
Rizzo, A.4
Vasanelli, L.5
-
23
-
-
0032635461
-
Dependence of the HfO2 thin film structure on the momentum transfer in ion beam assisted deposition
-
G. J. Exarhos, A. H. Guenther, M. R. Kozlowski, K. L. Lewis, and M. J. Soileau, eds., Proc. SPIE
-
2thin film structure on the momentum transfer in ion beam assisted deposition,” in Laser-Induced Damage in Optical Materials: 1998, G. J. Exarhos, A. H. Guenther, M. R. Kozlowski, K. L. Lewis, and M. J. Soileau, eds., Proc. SPIE 3578, 154-161 (1999).
-
(1999)
Laser-Induced Damage in Optical Materials: 1998
, vol.3578
, pp. 154-161
-
-
Scaglione, S.1
Sarto, F.2
Rizzo, A.3
Alvisi, M.4
-
24
-
-
85076480938
-
Plasma ion-assisted deposition: A novel technique for the production of optical coatings
-
F. Abeles, ed., Proc. SPIE
-
A. Zoller, S. Beisswenger, R. Gotzelmann, and K. Matl, “Plasma ion-assisted deposition: a novel technique for the production of optical coatings,” in Optical Interference Coatings, F. Abeles, ed., Proc. SPIE 2253, 394-402 (1994).
-
(1994)
Optical Interference Coatings
, vol.2253
, pp. 394-402
-
-
Zoller, A.1
Beisswenger, S.2
Gotzelmann, R.3
Matl, K.4
-
25
-
-
0006160255
-
High-reflectivity dense UV mirrors
-
of OSA Trends in Optics and Photonics (Optical Society of America, Washington, D.C.,)
-
P. Torchio, A. Gatto, M. Alvisi, G. Albrand, N. Kaiser, and C. Amra, “High-reflectivity dense UV mirrors,” in Optical Interference Coatings, Vol. 63 of OSA Trends in Optics and Photonics (Optical Society of America, Washington, D.C., 2001), pp. ThA7-1-ThA7-3.
-
(2001)
Optical Interference Coatings
, vol.63
, pp. ThA7-1-ThA7-3
-
-
Torchio, P.1
Gatto, A.2
Alvisi, M.3
Albrand, G.4
Kaiser, N.5
Amra, C.6
-
26
-
-
0029309502
-
High damage threshold Al2O3/SiO2 dielectric coatings for excimer lasers
-
2dielectric coatings for excimer lasers,” Thin Solid Films 260, 86-92 (1995).
-
(1995)
Thin Solid Films
, vol.260
, pp. 86-92
-
-
Kaiser, N.1
Uhlig, H.2
Schallenberg, U.B.3
Anton, B.4
Kaiser, U.5
Mann, K.6
Eva, E.7
-
27
-
-
0032679794
-
Changes in optical interference coatings exposed to 193 nm excimer laser radiation
-
G. J. Exarhos, A. H. Guenther, M. R. Kozlowski, K. L. Lewis, and M. J. Soileau, eds., Proc. SPIE
-
J. Heber, R. Thielsch, H. Blaschke, N. Kaiser, U. Leinhos, and A. Gortler, “Changes in optical interference coatings exposed to 193 nm excimer laser radiation,” in Laser-Induced Damage in Optical Materials: 1998, G. J. Exarhos, A. H. Guenther, M. R. Kozlowski, K. L. Lewis, and M. J. Soileau, eds., Proc. SPIE 3578, 83-96 (1999).
-
(1999)
Laser-Induced Damage in Optical Materials: 1998
, vol.3578
, pp. 83-96
-
-
Heber, J.1
Thielsch, R.2
Blaschke, H.3
Kaiser, N.4
Leinhos, U.5
Gortler, A.6
-
28
-
-
58149316379
-
Nano absorbing centers: A key point in laser damage thin films
-
H. E. Bennett, A. H. Guenther, M. R. Kozlowski, B. E. Newnam, and M. J. Soileau, eds., Proc. SPIE
-
J. Dijon, T. Poiroux, and C. Desrumaux, “Nano absorbing centers: a key point in laser damage thin films,” in Laser-Induced Damage in Optical Materials: 1996, H. E. Bennett, A. H. Guenther, M. R. Kozlowski, B. E. Newnam, and M. J. Soileau, eds., Proc. SPIE 2966, 315-325 (1996).
-
(1996)
Laser-Induced Damage in Optical Materials: 1996
, vol.2966
, pp. 315-325
-
-
Dijon, J.1
Poiroux, T.2
Desrumaux, C.3
-
29
-
-
0032667014
-
European project to develop an UV/VUV FEL facility on the ELETTRA storage ring
-
R. P. Walker, “European project to develop an UV/VUV FEL facility on the ELETTRA storage ring,” Nucl. Instrum. Methods Phys. Res. A 429, 179-184 (1999).
-
(1999)
Nucl. Instrum. Methods Phys. Res. A
, vol.429
, pp. 179-184
-
-
Walker, R.P.1
-
30
-
-
0035928260
-
The European UV/VUV storage ring FEL at ELETTRA: First operation and future prospects
-
R. P. Walker, J. A. Clarke, M. E. Couprie, G. Dattoli, M. Eriksson, D. Garzella, L. Giannessi, M. Marsi, M. W. Poole, E. Renault, R. Roux, M. Trovo, S. Werin, and K. Wille, “The European UV/VUV storage ring FEL at ELETTRA: first operation and future prospects,” Nucl. Instrum. Methods Phys. Res. A 467-468, 34-37 (2001).
-
(2001)
Nucl. Instrum. Methods Phys. Res. A
, vol.467-468
, pp. 34-37
-
-
Walker, R.P.1
Clarke, J.A.2
Couprie, M.E.3
Dattoli, G.4
Eriksson, M.5
Garzella, D.6
Giannessi, L.7
Marsi, M.8
Poole, M.W.9
Renault, E.10
Roux, R.11
Trovo, M.12
Werin, S.13
Wille, K.14
-
31
-
-
0034506359
-
A comparative study of the UV-optical and structural properties of SiO2, Al2O3, and HfO2 single layers deposited by reactive evaporation, ion assisted deposition, and plasma ion assisted deposition
-
A. J. Marker III and E. G. Arthurs, eds., Proc. SPIE
-
2single layers deposited by reactive evaporation, ion assisted deposition, and plasma ion assisted deposition,” in Inorganic Optical Materials II, A. J. Marker III and E. G. Arthurs, eds., Proc. SPIE 4102, 276-288 (2000).
-
(2000)
Inorganic Optical Materials II
, vol.4102
, pp. 276-288
-
-
Thielsch, R.1
Gatto, A.2
Heber, J.3
Kaiser, N.4
-
32
-
-
0034498426
-
Si-based multilayers with high thermal stability, in soft x-ray and EUV imaging systems
-
W. M. Kaiser and R. H. Stulen, eds., Proc. SPIE
-
N. Kaiser, S. Yulin, and T. Feigl, “Si-based multilayers with high thermal stability, in soft x-ray and EUV imaging systems,” in Soft X-Ray and EUVImaging Systems, W. M. Kaiser and R. H. Stulen, eds., Proc. SPIE 4146, 91-100 (2000).
-
(2000)
Soft X-Ray and Euvimaging Systems
, vol.4146
, pp. 91-100
-
-
Kaiser, N.1
Yulin, S.2
Feigl, T.3
-
33
-
-
0035450636
-
Heat resistance of EUV multilayer mirrors for long-time applications
-
T. Feigl, H. Lauth, S. Yulin, and N. Kaiser, “Heat resistance of EUV multilayer mirrors for long-time applications,” Microelectron. Eng. 57-58, 3-8 (2001).
-
(2001)
Microelectron. Eng.
, vol.57-58
, pp. 3-8
-
-
Feigl, T.1
Lauth, H.2
Yulin, S.3
Kaiser, N.4
|