Comparative study of the UV-optical and structural properties of SiO2, Al2O3, and HfO2 single layers deposited by reactive evaporation, ion assisted deposition, and plasma ion assisted deposition

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 4102, Issue , 2000, Pages 276-288

  Thielsch, R ^a   Gatto, A ^a   Heber, J ^a   Martin, S ^a   Kaiser, N ^a  

^a FRAUNHOFER INSTITUTE FOR APPLIED OPTICS AND PRECISION ENGINEERING   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

ALUMINA; DEGRADATION; DEPOSITION; EVAPORATION; INFRARED SPECTROSCOPY; MIRRORS; PHOTOMETRY; SILICA; SUBSTRATES; ULTRAVIOLET RADIATION; X RAY DIFFRACTION;

PLASMA ION ASSISTED DEPOSITION (PIAD); REACTIVE E-BEAM EVAPORATION (RE);

OPTICAL FILMS;

EID: 0034506359     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.405294     Document Type: Conference Paper

References (27)