Characterization of a silicon-micromachined thermal shear-stress sensor

AIAA Journal

Volumn 40, Issue 6, 2002, Pages 1099-1104

  Sheplak, Mark ^a   Chandrasekaran, Venkataraman ^a   Cain, Anthony ^a   Nishida, Toshikazu ^a   Cattafesta III, Louis N ^a  

^a UNIVERSITY OF FLORIDA   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

PROBES; SENSITIVITY ANALYSIS; SHEAR STRESS; SILICON NITRIDE; SPECTRUM ANALYSIS; SPURIOUS SIGNAL NOISE; THERMAL STRESS; THIN FILMS;

NOISE FLOOR MEASUREMENTS; NOISE FLOOR SPECTRA; VACUUM CAVITY;

SILICON SENSORS;

EID: 0036602755     PISSN: 00011452     EISSN: None     Source Type: Journal    
DOI: 10.2514/2.1758     Document Type: Article

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